Abstract
Low-temperature air-fireable glass-free metallic thick-film electrical conductor materials were developed for interconnections in electronic packaging. The thick film with composition (by weight) 96.60%Ag, 1.38%Cu, 0.28%Al, 0.35%Ti, and 1.39%Sn used Ti−Al as the active binder. After firing in air at 500 C it exhibited low electrical resistivity (6.2×10−6Ω-cm), good scratch resistance and strong bonding with the alumina substrate, with no pinholes. The firing caused complete melting of the particles in the film. Firing in argon rather than air degraded both electrical and bonding properties, due to the absence of oxygen, which helped to burn out the vehicle. The use of Ti rather than Ti−Al as the active binder resulted in holes in the thick film due to incomplete melting of the Ti-rich particles and also resulted in poor scratch resistance and weaker bonding to the substrate. Tin in the composition was important for promoting melting and protecting the active particles from oxidation during firing.
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References
S.J. Stein, C. Huang, and L. Cang, Solid State Technol., 24, 73 (1981).
D.P.H. Smith and J.C. Anderson, Philos. Mag. B, 43, 811 (1981).
D.U. Chang, Laser Welding Machining and Materials Processing (Publisher's City: IFS Publications Ltd., 1986), p. 27.
G. Shawhan, R. Bjorlin, and K. Nargi, Adv. Mater. Process. Inc. Met. Prog., 134, 85 (1988).
C.J.M. Lasance, H. Vinke, and H. Rosten, IEEE Trans. Comp., Pkg., Mfg. Technol., 18, 1 (1995).
M. Novotny, Precious Metals 1983 (San Francisco, CA: Pergamon Press Inc., 1984), p. 69.
S.G. Yu, Precious Metals 1987 (Allentown, PA: Int. Precious Metals Inst., 1987), p. 81.
J.R. Rellick, Thick Film Silver Metallization Composition, British patent GB 2130247A (1984).
R.R. Getty, B.E. Taylor, and C.R.S. Needs, Solid State Technol., 26, 163 (1983).
J.J. Cox, Jr., Solid State Technol. 23, 150 (1980).
T.R. Bloom, Copper Ink for Aluminum Nitride Country patent EP 0558841A1 (1992).
F. Sirotti, M. Prudenziati, T. Manfredini, B. Giardullo, and W. Anzolin, J. Mater. Sci., 25, 4688 (1990).
B.E. Taylor, J.J. Felten, S.J. Horowitz, J.R. Larry, and R.M. Rosenberg, Electrocompoment Sci. Technol., 9, 67 (1981).
V.K. Nagesh and R.M. Fulrath, Am. Ceram. Soc. Bull., 58, 455 (1979).
Z. Liu and D.D.L. Chung, J. Electron. Pkg., 123, 64 (2001).
M. Zhu and D.D.L. Chung, J. Electron. Mater. 23, 541 (1994).
R. Reicher, W. Smetana, E.U. Gruber, and J.C. Schuster, J. Mater. Sci. Mater. Electron. 9, 429 (1998).
A. Adlabnig, J.C. Schuster, R. Reicher, and W. Smetana, J. Mater. Sci., 33, 4887 (1998).
S. Rame, V. Puri, and D. Amalnerkar, J. Mater. Sci. Mater. Electron., 11, 667 (2000).
S. Kasukabe, J. Jpn. Soc. Powder Powder Metall., 39, 231 (1992).
A. Makino, Progress in Energy & Combustion Sci., 27, 1 (2001).
J.C. Lin and C.Y. Wang, Mater. Chem. Phys., 45, 235 (1996).
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Liu, Z., Chung, D.D.L. Low-temperature air-fireable glass-free metallic thick-film electrical conductor materials. J. Electron. Mater. 30, 1458–1465 (2001). https://doi.org/10.1007/s11664-001-0202-0
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DOI: https://doi.org/10.1007/s11664-001-0202-0