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Optical characterization of (GaIn)(NAs)/GaAs MQW structures

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Abstract

(GaIn)(NAs)/GaAs multiple quantum well (MQW) structures with high structural perfection as determined from high-resolution x-ray diffraction (XRD) analysis have been deposited by low-temperature metal organic vapor phase epitaxy (MOVPE) at 525°C using triethylgallium (TEGa) and trimethylindium (TMIn) in combination with 1,1-dimethylhydrazine (UDMHy) and tertiarybutylarsine (TBAs). The optical characteristics of as-grown MQW structures as a function of quaternary composition and of well width are established by PL spectroscopy at 300 K. With increasing N-content a reduction in PL efficiency and an increase in PL linewidth is observed. This behavior might be correlated to an increase in defect density with increasing N-content and/or to a bandstructure effect in this novel material system. For an increase in Inconcentration the tendency for a reduction in the extreme bowing of the band gap is detected. Strong quantization effects are observed for well widths below 5 nm only in this novel MQW system, which indicates significantly larger electron masses as compared to N-free (GaIn)As.

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Koch, J., Höhnsdorf, F. & Stolz, W. Optical characterization of (GaIn)(NAs)/GaAs MQW structures. J. Electron. Mater. 29, 165–168 (2000). https://doi.org/10.1007/s11664-000-0114-4

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  • DOI: https://doi.org/10.1007/s11664-000-0114-4

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