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Electrochemical Behavior of Silicon in the (NaCl-KCl-NaF-SiO2) Molten Salt

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Abstract

The electrochemical behavior of silicon was investigated in a molten salts system including saturation silicon dioxide. Silicon was electrodeposited and MoSi2 was formed on the employed molybdenum working electrode by the diffusivities of silicon and the substrate metals. Transient electrochemical techniques such as cyclic voltammetry and chronoamperometry were used to study the reaction mechanism at the molybdenum electrode. Cyclic voltammograms showed the possibility of electrodeposition of Si at −0.64 V versus Pt reference electrode in a NaCl-KCl-NaF-SiO2 system at 1073 K (800 °C). The electrodeposition of Si is single-step charge-transfer process and the cathode process is irreversible. Chronoamperometry studies indicated that electrocrystallization of Si is controlled by progressive nucleation with a three-dimensional growth mechanism.

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Acknowledgment

This work was supported by the National Natural Science Foundation of China (Nos. 50474079 and 50674039).

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Authors and Affiliations

  1. School of Metallurgical & Energy Engineering, Hebei Polytechnic University, Tangshan, Hebei, 063009, P.R. China

    Zongying Cai (Instructor), Yungang Li (Professor), Xiaofeng He (Research Scholar) & Jinglong Liang (Research Scholar)

  2. Institute of Advanced Materials, Mechanical Engineering College, Shijiazhuang, Hebei, 050003, P.R. China

    Zongying Cai (Instructor)

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  1. Zongying Cai
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  2. Yungang Li
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  3. Xiaofeng He
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Correspondence to Zongying Cai.

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Manuscript submitted November 18, 2009.

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Cai, Z., Li, Y., He, X. et al. Electrochemical Behavior of Silicon in the (NaCl-KCl-NaF-SiO2) Molten Salt. Metall Mater Trans B 41, 1033–1037 (2010). https://doi.org/10.1007/s11663-010-9393-1

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