Abstract
Zn4Sb3 has received interest for thermoelectric (TE) applications due to its low cost and low environmental impact. In this study, the Zn4Sb3 TE material was diffusion-bonded with multiple electrode materials of Ni, Ag, Cu, Pd and Ti for evaluation of the manufacturing of TE modules. Intermetallic compounds formed at the interfaces of the Zn4Sb3 diffusion couples, with Ni, Ag, Cu, and Pd exhibiting the selective reaction effect with zinc due to its high chemical affinity and low formation energies. Optimized bonding strengths of 6.6 to 8.2 MPa were achieved in Zn4Sb3 bonded with Ni, Ag and Cu materials at 350 °C. The Pd material could only bond at a temperature above 300 °C, and cracks presented after longer bonding times. As for the titanium, Zn4Sb3/Ti was successfully joined only at temperatures between 400 °C and 500 °C. It was observed that a rather thin TiSb2 intermetallic compound formed during the interfacial reactions between Zn4Sb3 and Ti, which grew significantly more slowly than those formed at the interfaces of Zn4Sb3 diffusion-coupled with Ni, Ag, Cu, and Pd metallic materials. Our results provide a reference for evaluating these common materials as suitable electrode and barrier layer candidates for utilizing the Zn4Sb3 TE material.
Similar content being viewed by others
References
H. Zhang, H.Y. Jing, Y.D. Han, L.Y. Xu, and G.Q. Lu: J. Alloys Compd., 2013, vol. 576, pp. 424–31.
K.Y. Lee and T.S. Oh: Mater. Sci. Forum., 2007, vol. 534–536, pp. 1493–6.
D.B. Xiong, N.L. Okamoto, and H. Inui: Scr. Mater., 2013, vol. 69, pp. 397–400.
G.J. Snyder, M. Christensen, E. Nishibori, T. Caillat, and B.B. Iversen: Nat. Mater., 2004, vol. 3, pp. 458–63.
P.Y. Lee and P.H. Lin: Energies., 2018, vol. 11, pp. 1–12.
T. Zou, W. Xie, J. Feng, X. Qin, and A. Weidenkaff: J. Nanomater., 2015, vol. 15, p. 642909.
S. Wang, H. Li, D. Qi, W. Xie, and X. Tang: Acta Mater., 2011, vol. 59, pp. 4805–17.
M.S. Song, S.M. Choi, W.S. Seo, J. Moon, and K.W. Jang: J. Korean Phys. Soc., 2012, vol. 60, pp. 1735–40.
G. Chen, M.S. Dresselhaus, G. Dresselhaus, J.P. Fleurial, and T. Caillat: Int. Mater. Rev., 2003, vol. 48, pp. 45–66.
T.M. Ritzer, P.G. Lau, and A.D. Bogard: in International Conference on Thermoelectrics, ICT, Proceedings, 1997, pp. 619–23.
M. Way, D. Luo, R. Tuley, and R. Goodall: J. Alloys Compd., 2021, vol. 858, p. 157750.
R. Zybala, K. Wojciechowski, M. Schmidt, and R. Mania: in 11th International Conference and Exhibition of the European Ceramic Society 2009, vol. 1, 2009, pp. 341–34.
H. Xia, F. Drymiotis, C.L. Chen, A. Wu, and G.J. Snyder: J. Mater. Sci., 2014, vol. 49, pp. 1716–23.
K. Placha, R.S. Tuley, M. Salvo, V. Casalegno, and K. Simpson: Materials (Basel)., 2018, vol. 11, p. 2483.
M. Weinstein and A.I. Mlavsky: Rev. Sci. Instrum., 1962, vol. 33, pp. 1119–20.
H. Xia, C.L. Chen, F. Drymiotis, A. Wu, Y.Y. Chen, and G.J. Snyder: J. Electron. Mater., 2014, vol. 43, pp. 4064–9.
J. Fan, L. Chen, S. Bai, and X. Shi: Mater. Lett., 2004, vol. 58, pp. 3876–8.
D. Zhao, X. Li, L. He, W. Jiang, and L. Chen: J. Alloys Compd., 2009, vol. 477, pp. 425–31.
D. Zhao, H. Geng, and X. Teng: J. Alloys Compd., 2012, vol. 517, pp. 198–203.
C.A. Schneider, W.S. Rasband, and K.W. Eliceiri: Nat. Methods., 2012, vol. 9, pp. 671–5.
G.P. Vassilev, T. Gomez-Acebo, and J.C. Tedenac: J. Phase Equilibria., 2000, vol. 21, pp. 287–301.
P. Nash and Y.Y. Pan: J. Phase Equilib., 1987, vol. 8, pp. 422–30.
X. Su, N.Y. Tang, and J.M. Toguri: J. Phase Equilib., 2002, vol. 23, pp. 140–8.
F.A. Fasoyinu and F. Weinberg: Metall. Trans. B., 1990, vol. 21B, pp. 549–58.
Y. Zhao, Z. Zhu, F. Yin, Z. Long, and Y. Wu: J. Phase Equilibria Diffus., 2014, vol. 35, pp. 186–94.
C.H. Wang, H.H. Chen, and C.W. Chiu: J. Electron. Mater., 2014, vol. 43, pp. 1362–9.
C.H. Wang, H.H. Chen, P.Y. Li, and P.Y. Chu: Intermetallics., 2012, vol. 22, pp. 166–75.
C.H. Wang and P.Y. Li: Mater. Chem. Phys., 2013, vol. 138, pp. 937–43.
T. Gómez-Acebo: Calphad Comput. Coupling Phase Diagrams Thermochem., 1998, vol. 22, pp. 203–20.
J.R. Friedman, J.E. Garay, U. Anselmi-Tamburini, and Z.A. Munir: Intermetallics., 2004, vol. 12, pp. 589–97.
C.F. Yang, S.W. Chen, K.H. Wu, and T.S. Chin: J. Electron. Mater., 2007, vol. 36, pp. 1524–30.
J.M. Song and K.L. Lin: J. Mater. Res., 2004, vol. 19, pp. 2719–24.
I.G. Edmunds and M.M. Qurashi: Acta Crystallogr., 1951, vol. 4, pp. 417–25.
W. Gierlotka and S.-W. Chen: J. Mater. Res., 2008, vol. 23, pp. 258–63.
M. Date, K.N. Tu, T. Shoji, M. Fujiyoshi, and K. Sato: J. Mater. Res., 2004, vol. 19, pp. 2887–96.
Y.C. Chan, M.Y. Chiu, and T.H. Chuang: Zeitschrift fuer Met. Res. Adv. Tech., 2002, vol. 93, pp. 95–8.
K. Suganuma, T. Murata, H. Noguchi, and Y. Toyoda: J. Mater. Res., 2000, vol. 15, pp. 884–91.
R. Mayappan, R.A. Zaman, Z.Z. Abidin, A.F. Alias, and M.N. Derman: Adv. Mater. Res., 2011, vol. 173, pp. 90–5.
K. Suganuma, K. Niihara, T. Shoutoku, and Y. Nakamura: J. Mater. Res., 1998, vol. 13, pp. 2859–65.
A. Jain, S.P. Ong, G. Hautier, W. Chen, W.D. Richards, S. Dacek, S. Cholia, D. Gunter, D. Skinner, G. Ceder, and K.A. Persson: APL Mater., 2013, vol. 1, p. 011002.
D.R. Frear and F.G. Yost: MRS Bull., 1993, vol. 18, pp. 49–54.
Y. Çiftci: Can. J. Phys., 2016, vol. 94, pp. 328–33.
G. Gosh: J. Mater. Res., 2004, vol. 19, pp. 1439–54.
C.W. Chang and K.L. Lin: J. Mater. Sci. Mater. Electron., 2019, vol. 30, pp. 13090–8.
I. Kawakatsu and S. Kitayama: Trans. Jpn. Inst. Metal., 1977, vol. 18, pp. 455–65.
H. Mehrer: Mater. Trans. JIM., 1996, vol. 37, pp. 1259–80.
J. Philibert: Defect Diffus. Forum., 1993, vol. 95–98, pp. 493–506.
S.W. Yoon, W.K. Choi, and H.M. Lee: Scr. Mater., 1999, vol. 40, pp. 327–32.
T. Gancarz, P. Bobrowski, S. Pawlak, N. Schell, R. Chulist, and K. Janik: J. Electron. Mater., 2018, vol. 47, pp. 49–60.
A. Hoxha, H. Oettel, and D. Heger: AIP Conf. Proc., 2010, vol. 1203, pp. 591–5.
R. Mayappan and Z.A. Ahmad: Intermetallics., 2010, vol. 18, pp. 730–5.
P.-C. Liu: National Cheng Kung University, 2004.
M.L. Williams: Occup. Environ. Med., 1996, vol. 53, pp. 504–504.
M. Galván-Arellano, J. Díaz-Reyes, and R. Peña-Sierra: Vacuum., 2010, vol. 84, pp. 1195–8.
D. Tsunami, K. Nishizawa, T. Oka, T. Shiga, T. Oku, and M. Takemi: in 2013 International Conference on Compound Semiconductor Manufacturing Technology, CS MANTECH 2013, 2013, pp. 233–36.
J.K. Lim, J.S. Russo, and E. Antonier: Plat. Surf. Finish., 1996, vol. 83, pp. 64–7.
S.S. Ha, J. Park, and S.B. Jung: Mater. Trans., 2011, vol. 52, pp. 1553–9.
S. Bhagat, H. Han, and T.L. Alford: Thin Solid Films., 2006, vol. 515, pp. 1998–2002.
F. Braud, J. Torres, J. Palleau, J.L. Mermet, and M.J. Mouche: Appl. Surf. Sci., 1995, vol. 91, pp. 251–6.
A.T. Dinsdale, A. Watson, A. Kroupa, J. Vřešťál, A. Emanová, and J. Vízdal: Atlas of Phase Diagrams for Lead-Free Soldering, COST Office, 2008.
J. Chen: National Sun Yat-sen University, 2013.
T.H. Chuang, S.W. Hsu, and C.H. Chen: IEEE Trans. Components Packag. Manuf. Technol., 2020, vol. 10, pp. 1657–65.
A. Tavassoli, A. Grytsiv, F. Failamani, G. Rogl, S. Puchegger, H. Müller, P. Broz, F. Zelenka, D. Macciò, A. Saccone, G. Giester, E. Bauer, M. Zehetbauer, and P. Rogl: Intermetallics., 2018, vol. 94, pp. 119–32.
M. Armbruster, W. Schnelle, U. Schwarz, and Y. Grin: Inorg. Chem., 2007, vol. 46, pp. 6319–28.
C.-H. Chen, W.-T. Yeh, and T.-H. Chuang: J. Alloys Compd., 2021, vol. 881, p. 160630.
Acknowledgments
The authors are grateful for the financial support of this study by the Ministry of Science and Technology, Taiwan, under Grant No. MOST-109-2221-E-002-118.
Conflict of interest
On behalf of all authors, the corresponding author states that there is no conflict of interest.
Author information
Authors and Affiliations
Corresponding author
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Manuscript submitted May 17, 2021, accepted October 10, 2021.
Rights and permissions
About this article
Cite this article
Chen, CH., Lee, PI., Yeh, WT. et al. Intermetallic Growth at the Interfaces Between Zn4Sb3 Thermoelectric Material and Various Metallic Electrodes. Metall Mater Trans A 53, 136–146 (2022). https://doi.org/10.1007/s11661-021-06499-9
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11661-021-06499-9