Abstract
The effect of reactor pressure on the growth rate, surface morphology and crystalline quality of GaN films grown on sapphire by metalorganic chemical vapor deposition is studied. The results show that as the reactor pressure increases from 2500 to 20000 Pa, the GaN surface becomes rough and the growth rate of GaN films decreases. The rough surface morphology is associated with the initial high temperature GaN islands, which are large with low density due to low adatom surface diffusion under high reactor pressure. These islands prolong the occurrence of 2D growth mode and decrease the growth rate of GaN film. Meanwhile, the large GaN islands with low density lead to the reduction of threading dislocation density during subsequent island growth and coalescence, and consequently decrease the full width at half maximum of X-ray rocking curve of the GaN film.
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Supported by the National Natural Science Foundation of China (Grant Nos. 60736033, 60676048) and Xi’an Applied Materials Innovation Fund (Grant No. XAAM-200703)
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Ni, J., Hao, Y., Zhang, J. et al. Effect of reactor pressure on the growth rate and structural properties of GaN films. Chin. Sci. Bull. 54, 2595–2598 (2009). https://doi.org/10.1007/s11434-009-0300-6
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DOI: https://doi.org/10.1007/s11434-009-0300-6