Abstract
We report the formation of antisymmetric wrinkling patterns in films on ridged substrates induced by the buckling instability of the substrates via finite element simulations and experiments. Our simulated results reveal that the uniaxial compression along the ridge can trigger both the wrinkling instability of the film and the lateral buckling instability of the ridge. The latter could change the wrinkles from a symmetric pattern to an antisymmetric pattern in a range of film-substrate modulus ratio and aspect ratio of the ridge profile, as validated by the experimental observations. A three-dimensional phase diagram with four buckling patterns, i.e., sole ridge buckling pattern, antisymmetric wrinkling pattern with different wavelengths from ridge buckling, symmetric wrinkling pattern without ridge buckling, and antisymmetric wrinkling pattern with the same wavelength as ridge buckling, is built with respect to the uniaxial compression, modulus ratio, and aspect ratio. The results not only elucidate how and when the interplay between the wrinkling instability and the ridge instability results in the formation of the antisymmetric wrinkling pattern but also offer a way to generate controllable complex wrinkling patterns.
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This work was supported by the National Key Research and Development Program of China (Grant No. 2022YFA1203602), the National Natural Science Foundation of China (Grant Nos. 12025206, 12072337, and 11872335), and the Fundamental Research Funds for the Central Universities (Grant No. WK2090000020).
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Zhang, J., Sun, Y., He, L. et al. Emergent antisymmetric wrinkling patterns in films on ridged substrates. Sci. China Phys. Mech. Astron. 66, 114612 (2023). https://doi.org/10.1007/s11433-023-2202-4
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DOI: https://doi.org/10.1007/s11433-023-2202-4