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Kalman filtering-based supervisory run-to-run control method for semiconductor diffusion processes

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References

  1. 1

    Sachs E, Hu A, Ingolfsson A. Run by run process control: combining SPC and feedback control. IEEE Trans Semicond Manufact, 1995, 8: 26–43

  2. 2

    Tan F, Pan T H, Li Z M, et al. Survey on run-to-run control algorithms in high-mix semiconductor manufacturing processes. IEEE Trans Ind Inf, 2015, 11: 1435–1444

  3. 3

    Butler S W, Stefani J A. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry. IEEE Trans Semicond Manufact, 1994, 7: 193–201

  4. 4

    Tseng S T, Tsung F, Liu P Y. Variable EWMA run-torun controller for drifted processes. IIE Trans, 2007, 39: 291–301

  5. 5

    Kim H, Park J H, Lee K S. A Kalman filter-based R2R control system with parallel stochastic disturbance models for semiconductor manufacturing processes. J Process Control, 2014, 24: 119–124

  6. 6

    Wang Y, Hussein I I. Awareness coverage control over large-scale domains with intermittent communications. IEEE Trans Autom Control, 2010, 55: 1850–1859

  7. 7

    Qin S J, Cherry G, Good R, et al. Semiconductor manufacturing process control and monitoring: a fab-wide framework. J Process Control, 2006, 16: 179–191

  8. 8

    Anderson B D O, Moore J B. Detectability and stabilizability of time-varying discrete-time linear systems. SIAM J Control Optim, 1981, 19: 20–32

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Acknowledgements

This work was supported by National Natural Science Foundation of China (Grant Nos. 61603303, 61803309, 61573365, 61833016), Natural Science Basic Research Program of Shaanxi (Grant No. 2017JQ6005), Fundamental Research Funds for the Central Universities (Grant No. G2017KY0008), and Innovation Development Foundation of Loving Students (Grant No. ASNIF2015-1502).

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Correspondence to Changhua Hu.

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Xu, Z., Hu, C. & Hu, J. Kalman filtering-based supervisory run-to-run control method for semiconductor diffusion processes. Sci. China Inf. Sci. 62, 89201 (2019). https://doi.org/10.1007/s11432-018-9593-1

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