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Semi-custom methodology to fabricate transmission electron microscopy chip for in situ characterization of nanodevices and nanomaterials

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Abstract

The fabrication of nanodevices on the delicate membrane window of the TEM (transmission electron microscopy) chip has the risk of breakage failure, limiting in-depth research in this area. This work proposed a methodology to address this issue, enabling secure in-situ transmission electron microscopic observation of many devices and materials that would otherwise be difficult to achieve. Combining semi-custom TEM chip design and front-side protected release technology, a variety of nanodevices were successfully fabricated onto the window membrane of the TEM chip and studied in situ. Moreover, the pressure tolerance of window membrane was investigated and enhanced with a reinforcing structure. As an example of typical applications, MoS2 devices on the TEM chip have been fabricated and electron beam-induced gate modulation and irradiation damage effects, have been demonstrated.

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Authors and Affiliations

  1. National Key Laboratory of Nano/Micro Fabrication Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China

    BoCheng Yu, FengYi Zheng, Dong Huang, ZhiTong Zhang & ZhiHong Li

  2. Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, 230026, China

    Mei Sun

  3. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China

    RuHao Pan & JunJie Li

  4. Key Laboratory for Physics and Chemistry of Nanodevices and Department of Electronics, Peking University, Beijing, 100871, China

    JiaMin Tian, FengJiao Lyu & Qing Chen

Authors
  1. BoCheng Yu
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  2. Mei Sun
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  3. RuHao Pan
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  4. JiaMin Tian
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  5. FengYi Zheng
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  6. Dong Huang
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  8. ZhiTong Zhang
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  9. JunJie Li
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  10. Qing Chen
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  11. ZhiHong Li
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Corresponding author

Correspondence to ZhiHong Li.

Additional information

This work was supported by the National Key Research and Development Program of China (Grant No. 2016YFA0200802), and the National Natural Science Fundation of China (Grant No. 11890672).

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Yu, B., Sun, M., Pan, R. et al. Semi-custom methodology to fabricate transmission electron microscopy chip for in situ characterization of nanodevices and nanomaterials. Sci. China Technol. Sci. 65, 817–825 (2022). https://doi.org/10.1007/s11431-021-1980-1

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  • DOI: https://doi.org/10.1007/s11431-021-1980-1

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