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Robust, healable and hydrophobically recoverable polydimethylsiloxane based supramolecular material with dual-activate hard segment

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Abstract

In this paper, a novel dual-activate hard segment strategy is proposed for the fabrication of polydimethylsiloxane (PDMS) based supramolecular polymer (PDMS-PDITC-IPDI). The unique design endows the PDMS-PDITC-IPDI with high toughness (43.1–24.5 MJ/m3), tensile strength (11.3–6.6 MPa) and elongation at break (730%–615%), and the mechanical properties and dynamic property can be regulated by varying degrees of hard segment activation. Moreover, the PDMS-PDITC-IPDI polymers exhibit excellent self-recovery property during successive loading-unloading processes. Additionally, both wettability damage caused by O2 plasma treatment and mechanical damage can be healed by simple heating, showing good hydrophobic recovery and self-healability. Taking advantages of merits of the PDMS-PDITC-IPDI, the applications of the material as recyclable adhesive and 3D printing material are also investigated.

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Authors and Affiliations

  1. Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin, 300350, China

    Chi Lv, YuHao Qi & JunPing Zheng

  2. College of Chemistry and Chemical Engineering, Dezhou University, Dezhou, 253023, China

    RuoFei Hu

Authors
  1. Chi Lv
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  2. YuHao Qi
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  3. RuoFei Hu
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  4. JunPing Zheng
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Corresponding authors

Correspondence to RuoFei Hu or JunPing Zheng.

Additional information

This work was supported by the National Natural Science Foundation of China (Grant No. 51473114), and the Natural Science Foundation of Tianjin (Grant No. 19JYCBJC17400).

Supporting Information

11431_2020_1674_MOESM1_ESM.doc

Robust, healable and hydrophobically recoverable polydimethylsiloxane based supramolecular material with dual-activate hard segment

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Lv, C., Qi, Y., Hu, R. et al. Robust, healable and hydrophobically recoverable polydimethylsiloxane based supramolecular material with dual-activate hard segment. Sci. China Technol. Sci. 64, 423–432 (2021). https://doi.org/10.1007/s11431-020-1674-7

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  • DOI: https://doi.org/10.1007/s11431-020-1674-7

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