Abstract
This study investigated the process parameter effects on the structural and optical properties of ZnO thin film using radio frequency (RF) magnetron sputtering on amorphous glass substrates. The process parameters included RF power and working pressure. Results show that RF power was increased to promote the crystalline quality and decrease ZnO thin film defects. However, when the working pressure was increased to 3 Pa the ZnO thin film crystalline quality became worse. At a 200 W RF power and 1 Pa working pressure, the ZnO thin film with an optical band gap energy of 3.225 eV was obtained.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Liu Y H, Sun W D. Preparation of ZnO thin films by RF magnetron sputtering and their properties (in Chinese). J Jinan Univer (Nat Sci & Med Edit), 2004, 25(3): 289–292
Zhang J, Xie Y Z, Xie E Q, et al. Photocatalysis properties of ZnO films grown by two-step oxidation (in Chinese). Chin J Vac Sci Tech, 2008, 28(4): 355–359
Yang L R, Jin Z G, Bu S J, et al. Preparation and optical properties of ZnO thin films (in Chinese). Ord Mat Sci Eng, 2004, 27(1): 34–38
Im S, Jin B J, Yi S. Ultraviolet emission and microstructural evolution in pulsed-laser-deposited ZnO films. J Appl Phys, 2000, 87(45): 4558–4561
Zhou B, Wang J L, Pan Y D, et al. Fabrication and physical properties of high-quality Zinc Oxide thin films. In: Proceedings of Sixth International Conference on Thin Film Physics and Applications. Shanghai: SPIE, 2008. 69840S-4
Srikant V, Clarke D R. On the optical band gap of zinc oxide. J Appl Phys, 1998, 83(10): 5447–5451
Kim S Y, Seo J M, Jang H W, et al. Effects of H2 ambient annealing in fully 002-textured ZnO:Ga thin films grown on glass substrates using RF magnetron co-sputter deposition. Appl Surf Sci, 2009, 255(46): 4616–4622
Mei Z X, Zhang X Q, Yi L X, et al. Preparation and photoluminescent properties of ZnO thin film (in Chinese). Chin J Lumin, 2002, 23(4): 389–392
Geng Q, Wang J H, Wang S G. Study on the parameter of ZnO thin films deposited by RF magnetron sputtering (in Chinese). Micro Tech, 2007, 5(2): 250–253
Bhuvana K P, Elanchezhiyan J, Gopalakrishnan N, et al. Optimization of Zn1−x AlxO film for antireflection coating by RF sputtering. J Alloy Compd, 2009, 473(4): 534–537
Author information
Authors and Affiliations
Corresponding author
Additional information
Supported by the National Natural Science Foundation of China (Grant Nos. 50772006, 10432050)
Rights and permissions
About this article
Cite this article
Tang, N., Wang, J., Xu, H. et al. Optical characterization of ZnO thin films deposited by RF magnetron sputtering method. Sci. China Ser. E-Technol. Sci. 52, 2200–2203 (2009). https://doi.org/10.1007/s11431-009-0230-1
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11431-009-0230-1