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High χ polystyrene-b-polycarbonate for next generation lithography

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References

  1. Ji S, Wan L, Liu CC, Nealey PF. Prog Polymer Sci, 2016, 54–55: 76–127

    Article  Google Scholar 

  2. Yang GW, Wu GP, Chen X, Xiong S, Arges CG, Ji S, Nealey PF, Lu XB, Darensbourg DJ, Xu ZK. Nano Lett, 2017, 17: 1233–1239

    Article  CAS  Google Scholar 

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  1. HGST, A Western Digital Company, San Jose, CA, 95119, USA

    Lei Wan

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  1. Lei Wan
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Correspondence to Lei Wan.

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Wan, L. High χ polystyrene-b-polycarbonate for next generation lithography. Sci. China Chem. 60, 679–680 (2017). https://doi.org/10.1007/s11426-017-9043-7

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  • DOI: https://doi.org/10.1007/s11426-017-9043-7

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