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Production and characterization of chitosan obtained from Rhizopus oryzae grown on potato chip processing waste

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Abstract

Potato chip processing waste of trimmed potato, potato peel and substandard (low-quality) potato chips, obtained from a potato chip processing plant, were used as substrates for chitosan production from Rhizopus oryzae. It was cultured on each waste product at 30 ± 2°C and 70% moisture content for 21 days. Fermented potato peel had the highest yield after 5 days of fermentation. The cultivation condition of chitosan obtained from R. oryzae was optimum for a peel size of less than 6 mesh, 70% moisture content and a pH of 5. Furthermore, the best extraction condition was using 46% sodium hydroxide at 46°C for 13 h followed by 2% acetic acid at 95°C for 8 h. The maximum chitosan yield obtained by these conditions was 10.8 g/kg substrate. Fungal chitosan properties were found to be 86–90% degree of deacetylation, molecular weight of 80–128 kDa and viscosity of 3.1–6.1 mPa s. Therefore, potato peel could be applied as a low cost substrate for chitosan production from R. oryzae.

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Acknowledgments

The authors would like to acknowledge Berli Jucker Foods Company for providing the raw materials and useful statistic information. We also thank to the Department of Chemistry, Faculty of Science, KMUTT and National Metal and Materials Technology Center (MTEC) of Thailand for their support in analytical instruments. We are grateful to the Thailand Research Fund-Master Research Grant (TRF-MAG), the Office of Small and Medium Enterprises Promotion (OSMEP) and the Commission on Higher Education for their financial support. We finally thank to Prof. Larry E. Erickson of Kansas State University for his fruitful and valuable discussions on our manuscript and Mr. Michael Willing to prove and edit our manuscript.

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Correspondence to Worapot Suntornsuk.

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Kleekayai, T., Suntornsuk, W. Production and characterization of chitosan obtained from Rhizopus oryzae grown on potato chip processing waste. World J Microbiol Biotechnol 27, 1145–1154 (2011). https://doi.org/10.1007/s11274-010-0561-x

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  • DOI: https://doi.org/10.1007/s11274-010-0561-x

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