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Tribology Letters

, 62:21 | Cite as

Improvement in Heat Resistance of Perfluoropolyether Lubricant Films on Magnetic Disks by UV Irradiation with a Bias Voltage on the Disk Surface

  • H. TaniEmail author
  • Y. Sakane
  • S. Koganezawa
  • N. Tagawa
Original Paper
Part of the following topical collections:
  1. STLE Tribology Frontiers Conference 2015

Abstract

Our previous study confirmed that the photoelectron-assisted ultraviolet (UV) irradiation with a bias voltage between the magnetic disk and the counter electrode above the disk surface increased the bonded ratio of a perfluoropolyether lubricant film on the disk surface. In this study, two types of lubricant materials (Fomblin Z-tetraol and Moresco ADOH) were prepared and coated on disks. After coating the lubricant films, UV irradiation of the lubricated disk surface was performed using the normal process and the photoelectron-assisted process, and the depletions of these lubricant films were compared using the pin-on-disk test with the laser heating function. The results showed that the lubricant film treated with normal UV irradiation without the bias voltage showed a deeper depletion of the lubricant film than that treated with photoelectron-assisted UV irradiation, and the ADOH film showed a shallower depletion than the Z-tetraol film. However, the molecular weight distributions of the ADOH films on DLC surfaces treated by UV irradiation were compared using time-of-flight secondary ion mass spectroscopy, and the film treated with photoelectron-assisted UV irradiation did not change owing to dissociation after photoelectron capture. Photoelectron-assisted UV irradiation led to the decomposition of the cyclo-triphosphazene end groups. Therefore, it is assumed that the depletion of lubricant films treated with photoelectron-assisted UV irradiation was reduced, since the bonding strength to the DLC surface increased because of the greater decomposition of end groups.

Keywords

Perfluoropolyether Heat-assisted magnetic recording Ultraviolet TOF-SIMS Heat resistance 

Notes

Acknowledgments

This work was financially supported in part by the Kansai University Outlay Support for Establishing Research Centers, 2014, and KAKENHI Grant No. 15H02216 from the Ministry of Education, Culture, Sports, Science and Technology (MEXT).

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Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  1. 1.Mechanical Engineering DepartmentKansai UniversityOsakaJapan
  2. 2.Western Digital TechnologiesSan JoseUSA

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