Interaction Between Disk Lubricants and Solvents in the Dip-Coating Process

Abstract

It has been reported earlier that, keeping all other factors fixed, the disk performance could vary significantly depending on the choice of solvent used in the dip-coating process. We surmised that the difference in the ability of solvent to disrupt the intermolecular hydrogen bonding between hydroxyl units of Z-dol or Z-tetraol would lead to a different structure or arrangement of the lubricant molecules as the solvent evaporated in the dip-coating process. Using proton NMR and IR spectroscopy, four solvents, hexafluorobenzene, Vertrel-XF, HFE7100, and FC72, were examined for their ability to disrupt the hydrogen bonding of Z-dol and Z-tetraol. The study has revealed that the said ability increases in the order of FC72 < HFE7100 < hexaflurobenzene < Vertrel-XF. Z-dol molecules, for example, are completely separated from each other in Vertrel-XF, but maintain their intermolecular hydrogen bonding in FC72. It has also revealed an extraordinary formation of complexoid between HFE molecules and Z-tetraol with MW _n of ∼2000. The complexoid has a specific stoichiometry of (Z-tetraol) _n (HFE) ∼15 _n and is not miscible with HFE. The formation of such complexoid was not observed for Z-tetraol of larger MW _n (3000).