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Synthesis of Supported Catalysts by Atomic Layer Deposition

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Abstract

A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.

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Acknowledgments

The work at Argonne National Laboratory was supported by the U.S. Department of Energy, BES-HFI, Chemical Sciences under Contract DE-AC-02-06CH11357. The work at Northwestern University was financially supported by The Dow Chemical Company under the Dow Methane Challenge Award.

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Authors and Affiliations

  1. Department of Chemistry, Northwestern University, Evanston, IL, 60208, USA

    Peter C. Stair

  2. Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, IL, 60439, USA

    Peter C. Stair

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  1. Peter C. Stair
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Correspondence to Peter C. Stair.

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Stair, P.C. Synthesis of Supported Catalysts by Atomic Layer Deposition. Top Catal 55, 93–98 (2012). https://doi.org/10.1007/s11244-012-9776-4

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