The relationship between the resistivity, the photoconductivity and the short-wave infrared (SWIR) transmission of HR GaAs:Cr wafers and the properties of various-diameter n-GaAs wafers made of LEC and VGF n-GaAs crystals is addressed. It is established that the macroscopic inhomogeneity of resistivity and photoconductivity in HR GaAs:Cr wafers is mostly determined by the uneven macroscopic lateral distribution of the shallow donor impurity in n-GaAs wafers. By means of SWIR transmission imaging, it is shown that the microscopic inhomogeneity in HR GaAs:Cr wafers is primarily determined by the n-GaAs crystal growth technology. The wafers exhibited a (100) orientation. It is demonstrated that a contactless steady state conductivity mapping technique can be applied for express evaluation of electron mobility-lifetime product (μe×τe) in HR GaAs:Cr wafers. It is shown that the macroscopic inhomogeneities of resistivity in the 76 mm and 100-diameter LEC HR GaAs:Cr (LEC – Liquid Encapsulated Czochralski) wafers are determined by the macroscopic inhomogeneity of the charge carrier concentration (CC) profiles in LEC n-GaAs wafers.
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Vinnik, A.E., Zarubin, A.N., Chsherbakov, I.D. et al. Macroscopic and Mesoscopic Inhomogeneities of Electrophysical, Optical, and Photoelectric Characteristics in Chromium Compensated Gallium Arsenide Wafers. Russ Phys J 66, 1212–1219 (2024). https://doi.org/10.1007/s11182-023-03064-2
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DOI: https://doi.org/10.1007/s11182-023-03064-2