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Planar Magnetron with Heated Boron Target for In Situ Investigation of Boron Film Deposition

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Russian Physics Journal Aims and scope

Planar magnetrons with a heated crystalline boron target are promising for depositing boron coatings intended for a wide range of scientific and industrial applications. The promotion of this type of magnetrons requires an in-depth investigation of the coating deposition process. A new version of such a magnetron is created for the vacuum electron-ion-plasma (VEIP) test installation for in situ synchrotron radiation monitoring of the boron coating synthesis. The paper proposes the design and parameters for this magnetron and discusses the boron coating deposition using the VEIP test installation.

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Authors and Affiliations

  1. Institute of High Current Electronics of the Siberian Branch of the Russian Academy of Sciences, Tomsk, Russia

    A. S. Bugaev, A. A. Cherkasov, V. P. Frolova, V. I. Gushenets, A. G. Nikolaev, E. M. Oks, K. P. Savkin, M. V. Shandrikov & A. V. Vizir

  2. Tomsk State University of Control Systems and Radioelectronics, Tomsk, Russia

    V. P. Frolova & E. M. Oks

Authors
  1. A. S. Bugaev
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  2. A. A. Cherkasov
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  3. V. P. Frolova
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  4. V. I. Gushenets
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  5. A. G. Nikolaev
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  6. E. M. Oks
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  7. K. P. Savkin
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  8. M. V. Shandrikov
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  9. A. V. Vizir
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Correspondence to A. S. Bugaev.

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Bugaev, A.S., Cherkasov, A.A., Frolova, V.P. et al. Planar Magnetron with Heated Boron Target for In Situ Investigation of Boron Film Deposition. Russ Phys J 66, 1108–1113 (2023). https://doi.org/10.1007/s11182-023-03050-8

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  • DOI: https://doi.org/10.1007/s11182-023-03050-8

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