The behavior of nickel and hydrogen impurities in silicon is studied by the methods of deep-level transient spectroscopy (DLTS) and Raman spectroscopy. It is shown that the vibrations of Ni and H atoms in Si are in the range of 925–985 cm–1. The DLTS spectra in n- and p-type silicon doped with Ni atoms exhibit two deep levels with the energies of Ev + 0.17 eV and Ec – 0.42 eV. It is found out that during chemical etching various hydrogen-bonded defect complexes are formed in Si doped with Ni, the energies of which are Ec – 0.18 eV, Ec – 0.54 eV, Ev + 0.26 eV, and Ev + 0.55 eV.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 9, pp. 126–130, September, 2022.
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Nasriddinov, S.S., Esbergenov, D.M. A Study of Complex Defect Formation in Silicon Doped With Nickel. Russ Phys J 65, 1559–1563 (2023). https://doi.org/10.1007/s11182-023-02801-x
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DOI: https://doi.org/10.1007/s11182-023-02801-x