The paper presents the experimental results of silicon cathodic arc evaporation in a continuous mode with the superimposed external arched magnetic field. Volt-ampere characteristics are obtained for arc discharge and the cathode spot velocity is determined at different external magnetic field. It is shown that the erosion rate of the silicon cathode surface depends on the magnetic field. Silicon coatings obtained by using a continuous mode of cathodic arc deposition, demonstrate the silicon droplet diameter ranging from 30 nm to 5 μm. Experiments show a decrease in the droplet number density and the volume fraction in coatings with increasing magnetic field.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 11, pp. 68–74, November, 2019.
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Dukhopel’nikov, D.V., Kirillov, D.V. Cathodic Arc Evaporation of Polycrystalline Silicon. Russ Phys J 62, 2033–2040 (2020). https://doi.org/10.1007/s11182-020-01941-8
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DOI: https://doi.org/10.1007/s11182-020-01941-8