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Russian Physics Journal

, Volume 59, Issue 2, pp 301–307 | Cite as

Growth Simulation and Structure Analysis of Obliquely Deposited Thin Films

  • B. A. BelyaevEmail author
  • A. V. Izotov
  • P. N. Solovev
Article

Based on the Monte Carlo method, a model of growth of thin films prepared by oblique angle deposition of particles is constructed. The morphology of structures synthesized by simulation is analyzed. To study the character of distribution of microstructural elements (columns) in the film plane, the autocorrelation function of the microstructure and the fast Fourier transform are used. It is shown that with increasing angle of particle incidence, the film density monotonically decreases; in this case, anisotropy arises and monotonically increases in the cross sections of columns, and the anisotropy of distribution of columns in the substrate plane also increases.

Keywords

oblique angle deposition simulation of film growth Monte Carlo method 

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Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  • B. A. Belyaev
    • 1
    • 2
    • 3
    Email author
  • A. V. Izotov
    • 1
    • 2
  • P. N. Solovev
    • 1
  1. 1.L. V. Kirensky Institute of Physics of the Siberian Branch of the Russian Academy of SciencesKrasnoyarskRussia
  2. 2.Siberian Federal UniversityKrasnoyarskRussia
  3. 3.Siberian State Aerospace University Named after Academician M. F. ReshetnevKrasnoyarskRussia

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