A model describing the process of silane dissociation in a high-frequency helium plasma discharge is proposed. The concentrations of the silane dissociation products are calculated numerically, and the role of metastable helium atoms in the synthesis of film-forming radicals is analyzed.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 90–96, January, 2010.
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Strunin, V.I., Kitaeva, E.A. & Khudaybergenov, G.Z. Calculations of the chemical composition of helium–silane plasma. Russ Phys J 53, 98–105 (2010). https://doi.org/10.1007/s11182-010-9393-2
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DOI: https://doi.org/10.1007/s11182-010-9393-2