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Photoelectrochemical study of electrodeposited TiO2 thin films onto F:SnO2 substrates

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Abstract

TiO2 thin films have been effectively fused onto F:SnO2 (FTO) substrates via the electrodeposition method. The influence of deposition temperature on the synthesis of F:SnO2 substrates and relative information of as-deposited and annealed TiO2 thin films have been studied. Novel TiO2 microspheres are detected on F:SnO2 substrates at an optimized electrodeposition potential. Raman bands approve the creation of single-anatase-phase TiO2. The optimized deposition surroundings show a decrease in the band gap of F:SnO2 substrates and TiO2 thin films. The determined photoelectrochemical properties of annealed TiO2 thin films indicate a fill factor of 51% and power conversion efficiency of 0.15% for application in solar cells.

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Acknowledgements

The authors are thankful to Dr. S. D. Sartale, Department of Physics, Savitribai Phule Pune University, Pune, India, and Dr. Sambhaji Shinde, Hanyang University, South Korea, for their help and fruitful discussion to carry out this work. The authors are also give thanks to the Research Advisory Committee for financial assistance to complete this work and the Department of Physics, Yashavantrao Chavan Institute of Science, Satara, for providing the laboratory facility.

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Correspondence to A. P. Torane.

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Pagare, P.K., Kanade, K.G. & Torane, A.P. Photoelectrochemical study of electrodeposited TiO2 thin films onto F:SnO2 substrates. Res Chem Intermed 44, 7277–7288 (2018). https://doi.org/10.1007/s11164-018-3556-0

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