Quantum lithography: status of the field

Abstract

This contribution provides an analysis of progress in the field of quantum lithography. We review the conceptual foundations of this idea and the status of research aimed at implementing this idea in the laboratory. The selection of a highly sensitive recording material that functions by means of multiphoton absorption seems crucial to the success of the proposal of quantum lithography. This review thus devotes considerable attention to these materials considerations.

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Correspondence to Robert W. Boyd.

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Boyd, R.W., Dowling, J.P. Quantum lithography: status of the field. Quantum Inf Process 11, 891–901 (2012). https://doi.org/10.1007/s11128-011-0253-y

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Keywords

  • Recording Material
  • Entangle Photon
  • Optical Lithography
  • Multiphoton Absorption
  • Direct Laser Writing