Quantum Information Processing

, Volume 11, Issue 4, pp 891–901 | Cite as

Quantum lithography: status of the field

  • Robert W. BoydEmail author
  • Jonathan P. Dowling


This contribution provides an analysis of progress in the field of quantum lithography. We review the conceptual foundations of this idea and the status of research aimed at implementing this idea in the laboratory. The selection of a highly sensitive recording material that functions by means of multiphoton absorption seems crucial to the success of the proposal of quantum lithography. This review thus devotes considerable attention to these materials considerations.


Recording Material Entangle Photon Optical Lithography Multiphoton Absorption Direct Laser Writing 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Springer Science+Business Media, LLC 2011

Authors and Affiliations

  1. 1.Institute of Optics and Department of Physics and AstronomyUniversity of RochesterRochesterUSA
  2. 2.Department of Physics and School of Information Technology and EngineeringUniversity of OttawaOttawaCanada
  3. 3.Department of Physics and Astronomy, Hearne Institute for Theoretical PhysicsLouisiana State UniversityBaton RougeUSA

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