Silicon carbon nitride (SiCN) coatings are produced by plasma-enhanced chemical vapor deposition using hexamethyldisilane, N2, and H2 as precursors at various nitrogen flow rates (F N). X-ray diffraction data, Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy, adhesion, friction coefficient, abrasive wear resistance, and microprofiling of the film surface are used to characterize the coatings deposited on silicon substrates. The x-ray diffraction analysis shows that all the films have an amorphous structure. The chemical bonding in the films results from the main Si―C, Si―N, and C―N interatomic interactions. With higher \( {F_{{{\text{N}}_2}}} \), the wear resistance of the films increases and their friction coefficient decreases since Si―C bonds are strengthened. The SiCN films deposited using hexamethyldisilane as the main source material exhibit tribological properties that are comparable with those of amorphous SiCN films deposited using other precursors.
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Translated from Poroshkovaya Metallurgiya, Vol. 48, No. 1–2 (465), pp. 86–94, 2009.
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Ivashchenko, V.I., Porada, O.K., Ivashchenko, L.A. et al. Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane. Powder Metall Met Ceram 48, 66–72 (2009). https://doi.org/10.1007/s11106-009-9096-9
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DOI: https://doi.org/10.1007/s11106-009-9096-9