Abstract
Matching the pumping generator (power supply) with the load (laser tube) is the determining criterion for efficient pumping of metal vapor lasers (MVLs). The challenge of achieving the energy potential of the MVL emerges when thyratrons are used as switches, which have a limited stable zone of operation with a maximum limit for most thyratrons ~ 6 kV. Matching the pumping generator with the load under these conditions is carried out providing an aperiodic discharge process of the peaking capacitor C0. Therefore, the pumping processes in the active medium significantly depend on the electrode locations in the gas discharge tube (GDT). In this work is shown, in the structure of GDT, where electrodes are located in the active medium (hot zone of the discharge channel), the pumping is occurred in the discharge process of the storage capacitor C, where C0 is a matching element. While the pumping is executed in the discharge process of C0 and the capacitance component of the GDT (CGDT) in GDT with electrodes located out of active medium where buffer gas (cold buffer zones). In this structure of GDT, the efficient pumping is realized using controlled switch, which prevents energy input going into GDT from C after charging C0 and the CGDT.
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Baalbaki, H., Yudin, N.A. Effect of electrode locations on the matching of the pumping generator with the load in metal vapor laser. Opt Quant Electron 55, 706 (2023). https://doi.org/10.1007/s11082-023-04999-z
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DOI: https://doi.org/10.1007/s11082-023-04999-z