Abstract
In this work, MoO3 films have been prepared using DC magnetron sputtering deposition technique in different growth conditions. And also the structural and optical properties of the films prepared in different conditions, has been systematically investigated. The results showed the relation between morphology, composition, and growth conditions. By increasing the ratio of O/Mo in the MoOx composition, not only the bandgap and the transmittance increase but also the size of the crystals decreases. In addition, it was found that by increasing the ratio of oxygen to argon and the DC power during deposition process, the phonon lifetime increases and consequently the crystallinity of the films will improve. This is consistent with the results of the structural study.
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Rabizadeh, M., Ehsani, M.H. & Shahidi, M.M. Tuning of physical properties in MoO3 thin films deposited by DC sputtering. Opt Quant Electron 53, 716 (2021). https://doi.org/10.1007/s11082-021-03360-6
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DOI: https://doi.org/10.1007/s11082-021-03360-6