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Comparison of optical, electrical, and surface characteristics of InGaN thin films at non-flow and small nitrogen flow cases

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Abstract

InGaN films in the non-flow and a small flow of nitrogen cases were fabricated by the RFMS (Radio Frequency Magnetron Sputter) method to compare crucial physical characteristics of its material. From the XRD analysis, application of small nitrogen flow in the InGaN thin film growth has been observed to result in changes in the crystal size, texture coefficient, and crystal structure parameters of the film. AFM results showed both films obtained have tightly packed granular, and almost homogeneous, and Nano-structural properties, but they are different in roughness, as increased by applying small nitrogen flow. Optical conductance peaks of the material in non-flow and small flow case were \(1.3957\times {10}^{10}\mathrm{ and }1.1496\times {10}^{10}(\mathrm{S}/\mathrm{m})\), showed a decrement in optical conductance by small nitrogen flow. In the same manner, electrical conductance peaks of the material in non-flow and small flow case were \(5.2512\times {10}^{12}\mathrm{ and }5.2236\times {10}^{12} (\mathrm{S})\), showed a decrement in electrical conductance by small nitrogen flow. In addition, the electrical conductivity of the InGaN material has been obtained at higher than the optical conductivity value of the InGaN material in both cases. Also, it was noticed that direct allowed optical band gap energy non-flow and small flow cases were 2.65 and 2.69 eV, displayed increased by applied small nitrogen flow. Essentially, many noteworthy physical properties such as crystalline size, texture coefficient, optical/electrical conductivity, the surface roughness of the films have been compared and studied for the non-flow and a small flow of nitrogen cases. Therefore; a better understanding of the structural/crystal and electrical characteristics of the InGaN film by applying/optimizing different growth conditions will be able to pave the way for InGaN device studies.

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Acknowledgements

This project was funded by the Muş Alparslan University Research Council (MUSBAP) (with Project No: BAP-20-VMYO-4901-01)

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The author (Asim Mantarcı) did all processes: conception or design of the work, data collection, data analysis, and interpretation, drafting the article, critical revision of the article, final approval of the version to be published.

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Correspondence to Asim Mantarcı.

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Mantarcı, A. Comparison of optical, electrical, and surface characteristics of InGaN thin films at non-flow and small nitrogen flow cases. Opt Quant Electron 53, 544 (2021). https://doi.org/10.1007/s11082-021-03203-4

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  • DOI: https://doi.org/10.1007/s11082-021-03203-4

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