Abstract
In this research, germanium–carbon coatings were deposited on ZnS and glass substrates by a RF plasma enhanced chemical vapor deposition method using GeH4 and CH4 as precursors. ZnS/Ge1−xCx double-layer antireflection coating with optical thickness of one quarter wavelength was designed. The samples were characterized by fourier transform infrared spectroscopy, X-ray diffraction (XRD), field emission scanning electron microscopy and nanoindentation. The coatings exhibited a structure free of pores with a very good adhesion to substrate. Based on the XRD patterns, no diffraction peak was found, so all the coatings mainly had an amorphous structure. The infrared (IR) transmittance spectrum show that the maximum IR transmittance in the band of 1030–1330 cm−1 was about 84.6%, which is higher than ZnS substrate by 10%. In addition, the reflection of ZnS substrate is about 25%. This system has reduced the reflection from the substrate by 15%.
Similar content being viewed by others
References
Che, X.S., Liu, Z.T., Li, Y.P., Wang, N.: Effects of hydrogen and substrate temperature on the chemical bonding and optical properties of germanium carbon films deposited by reactive sputtering. Appl. Surf. Sci. 258, 6212–6216 (2012)
Eshaghi, A., Aghaei, A.A.: Determination of optical properties in nanostructured TiO2 thin film fabricatedby electron beam physical vapor deposition. J. Opt. Technol. 83, 36–39 (2016)
Harrise, D.C.: Materials for Infrared Windows and Domes Properties and Performance. SPIE, Washington (1999)
Hu, C., Zheng, W., Tian, H., Xu, L., Jiang, Q.: Effects of the chemical bonding on the optical and mechanical properties for germanium carbide films used as antireflection and protection coating of ZnS windows. J. Phys. 18, 4231–4241 (2006a)
Hu, C.Q., Xu, L., Tian, H., Jin, Z.S., Lv, X.Y., Zheng, W.T.: Effects of radio frequency power on the chemical bonding, optical and mechanical properties for radio frequency reactive sputtered germanium carbide films. J. Phys. 39, 5074–5079 (2006b)
Hu, C.Q., Zheng, W.T., Li, J.J., Jiang, Q., Tian, H.W., Lu, X.L., Liu, J., Xu, L., Wang, J.B.: Ge1−x–Cx double-layer antireflection and protection coatings. Appl. Surf. Sci. 252, 8135–8138 (2006c)
Jamali, H., Mozafarinia, R., Eshaghi, A.: Evaluation of chemical and structural properties of germanium carbon coatings deposited by plasma enhanced chemical vapor deposition. J. Alloys Compd. 646, 360–367 (2015)
Jamali, H., Mozafarinia, R., Eshaghi, A.: The effect of carbon content on the phase structure of amorphous/nanocrystalline Ge1−x–Cx films prepared by PECVD. Surf. Coat. Technol. 310, 1–7 (2017)
Kazimierski, P., Jozwiak, L.: Transition from amorphous semiconductor to amorphous insulator in hydrogenated carbon-germanium films investigated by IR spectroscopy. J. Non-Cryst. Solids 355, 280–286 (2009)
Li, Y., Liu, Z., Zhao, H., Feng, L.: Infrared transmission properties of germanium carbon thin films deposited by reactive RF magnetron sputtering. Vacuum 83, 965–969 (2009)
Lima, M.M., Lacerda, R.G., Vilcarromero, J., Marques, F.C.: Coefficient of thermal expansion and elastic modulus of thin films. J. Appl. Phys. 86, 4936–4942 (1999)
Macleod, H.A.: Thin Film Optical Filters. Taylor & Francis, London (2010)
Mahmood, A., Shah, A., Castillon, F.F., Araiza, L.C., Heiras, J., Yasin, M., Khizar, M.: Surface analysis of GeC prepared by reactive pulsed laser deposition technique. Curr. Appl. Phys. 11, 547–550 (2011)
Morosanu, C.E.: Thin Films by chemical Vapour Deposition. Elsevier, New York (1990)
Pimpabute, N., Burinprakhoni, T., Somkhunthot, W.: Determination of optical constants and thickness of amorphous GaP thin film. Appl. Opt. 1, 257–268 (2011)
Ping, L., Ning, W., Sen, Ch., Bo, Ch., Tang, L.: Infrared transmissive and rain-erosion resistant performances of GeC/GaP double-layer thin films on ZnS substrates. Appl. Surf. Sci. 264, 538–544 (2013)
Reddy, K.N., Varadea, A., Krishnaa, A., Joshuab, J., Sasenc, D., Chellamalaia, M., Shashi, P.V.: Double side coating of DLC on Silicon by RF-PECVD for AR application. Procedia Eng. 97, 1416–1421 (2014)
Safaie, P., Eshaghi, A., Bakhshi, S.: Optical properties of oxygen doped diamond-like carbon thin films. J. Alloy. Compd. 672, 426–432 (2016)
Schrader, J.S., Huguenin, J.L., Soukup, R.J., Ianno, N.J., Exstrom, C.L., Darveau, S.: Thin films of GeC deposited using a unique hollow cathode sputtering technique. Sol. Energy Mater. Sol. Cells 90, 2338–2345 (2006)
Varade, A., Reddy, K.N., Sasen, D., Krishna, A., Chellamalai, M., Shashikumar, P.V.: Detailed raman study of DLC coating on Si (100) made by RFPECVD. Procedia Eng. 97, 1452–1456 (2014)
Wasa, K.: Thin Film Materials Technology. Springer, Berlin (2004)
Wu, X., Zhang, W., Yan, L., Luo, R.: The deposition and optical properties of Ge1−x–Cx thin film and infrared multilayer antireflection coatings. Thin Solid Films 516, 3189–3195 (2008)
Yashiki, Y., Kouketsu, S., Miyajima, Sh, Yamada, A., Konagai, M.: Influence of plasma power and substrate temperature on structure of nanocrystalline germanium carbon thin films by VHF plasma CVD. J. Non-Cryst. Solids 354, 2355–2358 (2008)
Zhua, J.Q., Jianga, C.Z., Hana, J.C., Yua, H., Wanga, J.Z., Jia, Z.C., Chenb, R.R.: Optical and electrical properties of nonstoichiometric a-Ge1−x–Cx films prepared by magnetron co-sputtering. Appl. Surf. Sci. 258, 3877–3881 (2012)
Zoita, C., Grigorescu, C., Vasiliu, I., Feraru, I.: Influence of process parameters on structure and optical properties of GeC thin films deposited by RF magnetron sputtering. Thin Solid Films 519, 4101–4104 (2011)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Sousani, F., Eshaghi, A., Mozafarinia, R. et al. Antireflection properties of germanium–carbon coating on zinc supplied substrate. Opt Quant Electron 49, 324 (2017). https://doi.org/10.1007/s11082-017-1159-4
Received:
Accepted:
Published:
DOI: https://doi.org/10.1007/s11082-017-1159-4