Abstract
Matching one-dimensional photonic bandgap theory with the grating condition, a novel design approach of the etched diffraction grating for the demultiplexer was proposed. With a stack of eight alternating dielectric layers per grating tooth, a computed reflection efficiency of 98% around the central wavelength was achieved by this method. The grating efficiency approached −0.78 dB with a channel uniformity of 0.06 dB over 120 nm bandwidth, and the neighbor channel crosstalk was better than −20 dB. An analysis of etching deviation suggests that the diffraction grating designed by this approach is very tolerant concerning fabrication imperfections.
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This work was supported by the Key Research and Development Plan Foundation of Jiangsu Province, China (Grant No. BE2016133).
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Mao, Y., Zhu, J., Du, B. et al. Design and analysis of concave diffraction grating with one-dimensional photonic bandgap structure. Opt Quant Electron 49, 263 (2017). https://doi.org/10.1007/s11082-017-1098-0
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DOI: https://doi.org/10.1007/s11082-017-1098-0