Abstract
In this work, a UV photodetector was fabricated by depositing 25 nm nickel oxide nanoparticles on an n-type silicon substrate by a closed-field unbalanced dual magnetron sputtering technique. The fabricated photodetector showed maximum spectral responsivity of 4.8 mA/W at 318 nm with maximum quantum efficiency of 1.87 %. This is good attempt to produce such nanostructures with high quality and low cost for UV detection application.
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Hammadi, O.A., Khalaf, M.K. & Kadhim, F.J. Farbication of UV photodetector from nickel oxide nanoparticles deposited on silicon substrate by closed-field unbalanced dual magnetron sputtering techniques. Opt Quant Electron 47, 3805–3813 (2015). https://doi.org/10.1007/s11082-015-0247-6
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DOI: https://doi.org/10.1007/s11082-015-0247-6