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Reaction mechanism studies for platinum nanoparticle growth by atomic layer deposition

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Abstract

Mass spectrometry is used to study the reaction mechanism of platinum (Pt) atomic layer deposition (ALD) on large quantities of high surface area silica gel particles in a fluidized bed reactor. (Methylcyclopentadienyl)trimethylplatinum [(MeCp)PtMe3] and oxygen are used as precursors. Studies are conducted at a substrate temperature of 320 °C. The self-limiting behavior of ALD appears to be disrupted with overexposure of Pt precursor. The amount of the deposited Pt and the size of the Pt nanoparticles increase with an increasing overdose time of Pt precursor. This can be explained by the thermal decomposition of Pt precursor at the reaction temperature of 320 °C and the in situ sintering of Pt nanoparticles forming larger particles. This finding is significant and its understanding is essential for better control of Pt deposition to achieve desirable morphological and structural properties for different application requirements.

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Authors and Affiliations

  1. Department of Chemical and Biological Engineering, University of Colorado, Boulder, CO, 80309, USA

    Xinhua Liang, Yun Zhou, Jianhua Li & Alan W. Weimer

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  1. Xinhua Liang
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  2. Yun Zhou
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  3. Jianhua Li
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  4. Alan W. Weimer
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Correspondence to Alan W. Weimer.

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Liang, X., Zhou, Y., Li, J. et al. Reaction mechanism studies for platinum nanoparticle growth by atomic layer deposition. J Nanopart Res 13, 3781–3788 (2011). https://doi.org/10.1007/s11051-011-0299-x

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  • DOI: https://doi.org/10.1007/s11051-011-0299-x

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