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Measurement of the thickness of natural oxide on a silicon relief step structure

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Results of measurements of the thickness of natural oxide on a silicon structure in the form of a set of elements (protrusions) with trapezoidal profile, 2 μm step, width of upper base 10 nm, height of elements 500 nm, and tilt angle of lateral side of element relative to its base 54.7° are presented. The entire structure is covered with a natural oxide that appeared at room temperature. The distance between the {111} planes of silicon is used to assure traceability of the measurements.

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References

  1. T. Engel, “The interaction of molecular and atomic oxygen with Si(100) and Si(111),” Surf. Sci. Rep., 18, 91 (1993).

    Article  MathSciNet  ADS  Google Scholar 

  2. E. O. Filatova et al., “Investigation of natural oxide on the (111) and (100) surfaces and KEF brand (111) surface and KDB brand surface of monocrystalline silicon by means of reflection spectroscopy,” Pisma Zh. Tekh. Fiz., 35, Iss. 2, 36 (2009).

    MathSciNet  Google Scholar 

  3. V. P. Gavrilenko et al., “Test object of the linewidth with a trapezoidal profile and three certified sizes for an SEM and AFM,” Meas. Sci. Tech., 20, No. 084022, 7 (2009).

    Google Scholar 

  4. M. N. Filippov et al., “Reference material for transmission electron microscope calibration,” Meas. Sci. Tech., 22, No. 094014, 5 (2011).

    Google Scholar 

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The present study was completed with the support of the Ministry of Education and Science of the Russian Federation (State Contract No. 16.552.11.7022) with the use of equipment from the Time-Sharing Centers of the Moscow Institute of Physics and Technology and the Research Center for the Study of the Properties of Surfaces and Vacuum.

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Authors and Affiliations

  1. Moscow Institute of Physics and Technology (MFTI), Dolgoprudnyi, Russia

    V. P. Gavrilenko, A. V. Zablotskii, A. A. Kuz’min & M. A. Ermakova

  2. Research Center for the Study of the Properties of Surfaces and Vacuum (NITsPV), Moscow, Russia

    A. A. Kuzin, A. Yu. Kuzin, V. B. Mityukhlyaev, A. V. Rakov, P. A. Todua & M. N. Filippov

  3. Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences (IONKh RAN), Moscow, Russia

    M. N. Filippov

Authors
  1. V. P. Gavrilenko
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  2. A. V. Zablotskii
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  3. A. A. Kuzin
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  4. A. Yu. Kuzin
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  5. A. A. Kuz’min
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  6. M. A. Ermakova
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  7. V. B. Mityukhlyaev
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  8. A. V. Rakov
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  9. P. A. Todua
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  10. M. N. Filippov
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Corresponding author

Correspondence to M. N. Filippov.

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Translated from Metrologiya, No. 5, pp. 14–18, May, 2013.

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Gavrilenko, V.P., Zablotskii, A.V., Kuzin, A.A. et al. Measurement of the thickness of natural oxide on a silicon relief step structure. Meas Tech 56, 616–619 (2013). https://doi.org/10.1007/s11018-013-0254-6

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  • DOI: https://doi.org/10.1007/s11018-013-0254-6

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