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Effect of a change in phase of the reflected wave on measurements of the shape of a surface in optical profilometry

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Measurement Techniques Aims and scope

We examine the effect of a change in phase of the reflected electromagnetic wave when measuring a surface profile using a scanning white-light interference microscope and a phase-shifting coherent light interference microscope. We present the results of experiments measuring the thickness of an aluminum coating deposited on a silicon wafer, without any phase shift correction and with phase shift correction, calculated from handbook data and from the results of ellipsometric measurements. We compare with the results of measurements on the same object on an atomic force microscope.

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References

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Authors and Affiliations

  1. All-Russia Research Institute for Optophysical Measurements (VNIIOFI), Moscow, Russia

    V. L. Minaev & K. E. Loshchilov

Authors
  1. V. L. Minaev
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  2. K. E. Loshchilov
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Correspondence to K. E. Loshchilov.

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Translated from Izmeritel’naya Tekhnika, No. 7, pp. 36–38, July, 2010.

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Minaev, V.L., Loshchilov, K.E. Effect of a change in phase of the reflected wave on measurements of the shape of a surface in optical profilometry. Meas Tech 53, 778–781 (2010). https://doi.org/10.1007/s11018-010-9576-9

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  • DOI: https://doi.org/10.1007/s11018-010-9576-9

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