We describe methods for using synchrotron radiation to study the metrological characteristics of multilayer nanostructures to be used as optical filters in the extreme vacuum ultraviolet range for solving nanoelectronics problems. For the synchrotron radiation metrology beamline, we have developed working standards for spectral irradiance and integrated irradiance.
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Translated from Izmeritel’naya Tekhnika, No. 7, pp. 32–35, July, 2010.
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Zolotarevskii, Y.M., Anevsky, S.I., Ivanov, V.S. et al. Use of synchrotron radiation for studying multilayer nanostructures. Meas Tech 53, 772–777 (2010). https://doi.org/10.1007/s11018-010-9575-x
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DOI: https://doi.org/10.1007/s11018-010-9575-x