Abstract
The chemical and structural modification of organoborosilicate thin films was attempted by using alcohol-induced deboronation. A photocurable organoborosilicate was synthesized from 3-methacryloxypropyltrimethoxysilane and boric acid via a catalyst- and solvent-free and non-aqueous alcohol condensation process. The formation of Si-O-B linkage was suggested by 29Si NMR spectroscopy. A colorless and transparent thin film of the organoborosilicate was prepared by UV irradiation. According to Fourier transform infrared spectroscopy, a peak attributed to the stretching vibration of borate disappeared after the alcohol treatment. Moreover, atomic force microscopy revealed the surface structural change of the thin film via the deboronation process. These results indicate that the borate was eliminated by the treatment, suggesting that this method enables to apply to the direct nanofabrication.
Highlights
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A photocurable organoborosilicate was synthesized via catalyst- and solvent-free alcohol condensation.
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Borate was eliminated from the organoborosilicate thin film in the presence of methanol vapor.
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The thin film changed in chemical composition and structure due to methanol vapor treatment.
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The deboronation from organoborosilicate is expected to apply to a new type of nanofabrication.
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Acknowledgements
The present work is partially supported by grand-in-aids from the Ministry of Education, Culture, Sports, Science and Technology (MEXT), administrated by Japan Society for the Promotion of Science (JSPS), and also by PRESTO, JST, Grant Number JPMJPR19I3, Japan.
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Fukatsu, A., Karim, A., Okada, K. et al. Alcohol-induced deboronation of organoborosilicate thin films. J Sol-Gel Sci Technol 104, 485–489 (2022). https://doi.org/10.1007/s10971-022-05897-8
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DOI: https://doi.org/10.1007/s10971-022-05897-8