Abstract
We report the fabrication of nano silver coated patterned silica thin film by sol–gel based soft lithography technique. Initially, silica gel film on soda lime silica glass was prepared by dipping technique from a silica sol of moderate silica concentration. A PolydimethylSiloxane elastomeric stamp containing the negative replica of the patterns of commercially available compact disc was used for embossing the film and the embossed film was cured up to 450 °C in pure oxygen atmosphere for oxide film. Finally, a precursor solution of AgNO3 in water containing polyvinyl alcohol as an organic binder was made and used for coating on the patterned silica film by dipping technique and cured the sample up to 450 °C in reducing gas atmosphere to obtain nano silver layer. The formation of only cubic silver (~4.0 nm) and both cubic silver (~5.2 nm) and silver oxide (~3.6 nm) crystallites at 350 and 450 °C film curing temperatures respectively were confirmed by XRD measurements. The % of nano silver metal and silver oxide were 75.4 and 24.6 respectively. The nano-structured surface feature was visualized by FESEM whereas AFM revealed the high fidelity grating structure of the films. Presence of both spherical and rectangular structure (aspect ratio, 2.37) of nano silver/silver oxide was confirmed by TEM. The films were also characterized by UV–Vis spectral study. The patterned film may find application in chemical sensor devices.
Similar content being viewed by others
References
Chen X, Jiang K (2008) Large-area metal-coated dielectric nanopillar array for excitation of surface plasmon resonance. In: Dimov S, Menz W (eds) Multi-material micro manufacture. Whittles, Cardiff
Homola J, Yee SS, Gauglitz G (1999) Sens Actuators B 54:3–15
Sil D, Deb Roy R, Jana S, Mukherjee R, Bhadra SK, Biswas PK (2011) J Sol–Gel Sci Technol 59:117–127
Deb Roy R, Sil D, Jana S, Dasgupta K, Biswas PK, Bhadra SK (2012) Photonic Sens 47(1):289–298
Hua F, Shi J, Lvov Y, Cuil T (2002) Nano Lett 2:1219–1222
Xia Y, Venkateswaran N, Qin D, Tien J, Whitesides GM (1998) Langmuir 14:363–371
Bhuvana T, Kulkarni GU (2008) ACS Nano 2:457–462
Corbierre MK, Beerens J, Lennox RB (2005) Chem Mater 17:5774–5779
Pease RF, Chou SY (2008) Proc IEEE 96:248–270
Mukherjee R, Pangule RC, Sharma A, Banerjee I (2007) J Chem Phys 127:064703–064706
Yuan X-C, Yu WX, He M, Bu J, Cheong WC, Niu HB, Peng X (2005) Appl Phys Lett 86:114102–114102-3
Mukherjee R, Sharma A, Patil G, Faruqui D, Gooh Pattader PS (2008) Bull Mater Sci 31:249–261
Abargues R, Gradess R, Canet-Ferrer J, Abderrafi K, Valdes JL, Martinez-Pastor J (2009) New J Chem 33:913–917
Garrelie F, Colombier JP, Pigeon F, Tonchev S, Faure N, Bounhalli M, Reynaud S, Parriaux O (2011) Opt Express 19:9035–9043
Yamagishia S, Takahashia Y (1993) J Nucl Mater 207:255–265
Kundu TK, Karak N, Barik P, Saha S (2011) Inter J Soft Comp Eng 1:19–24
Cioarec C, Melpignano P, Gherardi N, Clergereaux R, Villeneuve C (2011) Langmuir 27:3611–3617
Skorka O, Joseph D (2009) Design and fabrication of pads B for flip-chip bonding of custom dies to CMOS dies, Application note October 28 (MS-18-10.28.09-A), University of Alberta, Alberta
Das S, Jana S, Das N, Ghosh SS, Biswas PK (2011) J Sol–Gel Sci Technol 60:116–124
Clemenson S, Leonard D, Sage D, David L, Espuche E (2008) J Polym Sci: Part A: Polym Chem 46:2062–2071
Khanna PK, Singh N, Charan S, Subbarao VVVS, Gokhale R, Mulik UP (2005) Mater Chem Phys 93:117–121
Das N, Biswas PK (2011) J Mater Sci. doi:10.1007/s10853-011-5797-9
Sahoo PK, Kamal SSK, Kumar TJ, Sreedhar B, Singh AK, Srivastava SK (2009) Def Sci J 59:447–455
Jana S, Vuk AS, Mallick A, Orel B, Biswas PK (2011) Mater Res Bull 46:2392–2397
Jana S, Baek IC, Lim MA, Seok SI (2008) J Colloid Interface Sci 322:473–477
Acknowledgments
Authors are thankful to the Director, CSIR-CGCRI, Kolkata, India for his permission to publish this paper. They are thankful to Analytical Facility Division for microstructural characterization of films. The work has been done under Department of Science and Technology (DST), New Delhi, Government of India sponsored project (Sanction No. DST/TSG/PT/2006/74).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Sarkar, S., Biswas, P.K. & Jana, S. Nano silver coated patterned silica thin film by sol–gel based soft lithography technique. J Sol-Gel Sci Technol 61, 577–584 (2012). https://doi.org/10.1007/s10971-011-2663-9
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10971-011-2663-9