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Sol–gel preparation of antireflective coatings at 351 nm with different thickness and improved moisture-resistance

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Abstract

Antireflective (AR) coatings at 351 nm with different thickness were designed and prepared by sol–gel process using tetraethylorthosilicate as precursor and ammonia as catalyst. The parameters of these coatings, including film thickness and refractive index, were calculated by optical formula and the coatings were prepared accordingly. Sol dilution method was used to adjust the film thickness. The wavelengths of maximum transmission measured by UV–Vis spectrophotometer, were used to monitor the film thickness. It was found that AR coatings with higher thickness possess better abrasion-resistance. Hydroxyl terminated polydimethylsiloxane (PDMS) was added into pure silica sol to improve both the abrasion-resistance and moisture-resistance of AR coating.

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Authors and Affiliations

  1. Key Laboratory of Green Chemistry and Technology, College of Chemistry, Sichuan University, Chengdu, 610064, Sichuan, People’s Republic of China

    Xinxiang Zhang, Yulu Zhang, Haiping Ye, Bo Xiao & Bo Jiang

  2. Research Center of Laser Fusion, China Academy of Engineering Physical, 621900, Mianyang, People’s Republic of China

    Lianghong Yan & Haibing Lv

Authors
  1. Xinxiang Zhang
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  2. Yulu Zhang
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  3. Haiping Ye
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  4. Bo Xiao
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  5. Lianghong Yan
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  6. Haibing Lv
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  7. Bo Jiang
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Corresponding author

Correspondence to Bo Jiang.

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Zhang, X., Zhang, Y., Ye, H. et al. Sol–gel preparation of antireflective coatings at 351 nm with different thickness and improved moisture-resistance. J Sol-Gel Sci Technol 58, 340–344 (2011). https://doi.org/10.1007/s10971-011-2398-7

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  • DOI: https://doi.org/10.1007/s10971-011-2398-7

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