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Deposition of silica thin films formed by sol–gel method

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Abstract

Deposition of silica thin films on silicon wafer was investigated by in situ mass measurements with a microbalance configured for dip coating. Mass change was recorded with respect to deposition time when the substrate was fully immersed in the silica sol. Mass gain during deposition was higher than predicted from monolayer coverage of silica nano particles. This implied that deposition was facilitated by gelling of the nanoparticles on the substrate. The rate of deposition was enhanced by increasing the particle concentration in the sol and by decreasing the particle size from 12 to 5 nm. Increasing the salt concentration of the silica sol at constant pH enhanced the deposition of the silica particles. Reducing the pH of the sol from 10 to 6 decreased the deposition rate due to aggregation of the primary silica particles.

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Acknowledgments

This work was financially supported by The Research Council of Norway (NANOMAT, grant number 182033/S10). Bozena Tokarz, EKA Chemicals is acknowledged for a valuable discussion about silica sols.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, Norwegian University of Science and Technology, 7491, Trondheim, Norway

    Hasan Guleryuz, Tor Grande & Mari-Ann Einarsrud

  2. SINTEF Materials and Chemistry, 7465, Trondheim, Norway

    Ingeborg Kaus

  3. UFR des Sciences et Techniques, Université de Franche-Comté, 25030, Besancon, France

    Claudine Filiàtre

Authors
  1. Hasan Guleryuz
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  2. Ingeborg Kaus
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  3. Claudine Filiàtre
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  4. Tor Grande
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  5. Mari-Ann Einarsrud
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Correspondence to Mari-Ann Einarsrud.

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Guleryuz, H., Kaus, I., Filiàtre, C. et al. Deposition of silica thin films formed by sol–gel method. J Sol-Gel Sci Technol 54, 249–257 (2010). https://doi.org/10.1007/s10971-010-2190-0

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  • DOI: https://doi.org/10.1007/s10971-010-2190-0

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