Abstract
Al–B–NiO thin films were prepared using the sol–gel process and deposited on Indium tin oxide (ITO)-coated glass substrates via the dip-coating technique for the purpose of developing high performance electrochromic materials. The influence of the anneal on the structural and electrochromic properties of Al–B–NiO films is reported. Thermogravimetry (TG) and differential thermal analysis (DTA), cyclic voltammetry measurements (CV), UV spectrophotometer, atomic force microscopy (AFM) and X-ray diffraction (XRD) have been used to investigate the structural and electrochromic properties. The thickness of the films was determined by spectrophotometric analysis in 350–1,000 nm wavelength. Results showed that the Al–B–NiO thin films treated at high temperature have both the excellent electrochromic properties and good reversibility. The transmittance change (ΔT) of the film treated at 500 °C reaches still ~50% at the wavelength of 550 nm. The microstructure and the surface morphology were considered to play an important role in the electrochromic properties with different temperatures.
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Acknowledgments
The author is grateful for helpful discussion from Mr. X.T. Sui. The author would like to thank the help of Suling Zhao for the atomic force measurements. This work was financial support by the Program for Changjiang Scholars and Innovative Research Team in University, Ministry of Education, China (PCSIRT, No. IRT0547).
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Lou, X.C., Zhao, X.J., Xiong, Y.L. et al. The influence of annealing on electrochromic properties of Al–B–NiO thin films prepared by sol–gel. J Sol-Gel Sci Technol 54, 43–48 (2010). https://doi.org/10.1007/s10971-010-2155-3
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DOI: https://doi.org/10.1007/s10971-010-2155-3