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Covalent grafting of organoalkoxysilanes on silica surfaces in water-rich medium as evidenced by 29Si NMR

Journal of Sol-Gel Science and Technology volume 50, pages 152–157 (2009)Cite this article

Abstract

This paper addresses two questions related to functionalization of silica particles: (1) is the grafting of hydrophobic organoalkoxysilanes on a silica surface possible in water-rich medium and (2) how to prove the formation of covalent bonds with the surface? Trimethylethoxysilane, dimethyldiethoxysilane and methyltriethoxysilane have been reacted with precipitated silica in water-rich medium (water/ethanol 25/75 v/v) and 29Si MAS NMR was used to answer both questions: 29Si chemical shift values of the organosilicon units in the case of trimethylethoxysilane and dimethyldiethoxysilane clearly distinguished between self-condensation reactions and surface reactions through covalent bonds.

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Acknowledgment

The authors are grateful to Rhodia Recherche for their financial support, Dr A. Pottier for her interest with this work, J. Maquet for assistance in solid state NMR and M-N. Rager in solution-state NMR.

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Authors and Affiliations

  1. Laboratoire de Chimie de la Matière Condensée de Paris, Université Pierre et Marie Curie-Paris 6 and CNRS, 4 place Jussieu, 75252, Paris cedex 5, France

    Sophie de Monredon–Senani, Christian Bonhomme, François Ribot & Florence Babonneau

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  1. Sophie de Monredon–Senani
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  2. Christian Bonhomme
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  3. François Ribot
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  4. Florence Babonneau
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Correspondence to Florence Babonneau.

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de Monredon–Senani, S., Bonhomme, C., Ribot, F. et al. Covalent grafting of organoalkoxysilanes on silica surfaces in water-rich medium as evidenced by 29Si NMR. J Sol-Gel Sci Technol 50, 152–157 (2009). https://doi.org/10.1007/s10971-009-1920-7

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  • DOI: https://doi.org/10.1007/s10971-009-1920-7

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