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Preparation of new photosensitive TiO2 gel films using chemical additives including nitrogen and their patterning

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Abstract

TiO2 gel films were prepared from titanium tetra-n-butoxide chemically modified with benzoylacetoanilide including nitrogen by the sol-gel method. The obtained gel film showed an absorption band, characteristic of the chelate ring, at 325 nm. The absorption band disappeared almost completely with UV-irradiation (2.7 J cm−2) using a high pressure mercury lamp. This indicates that the gel film exhibits photosensitivity. The decomposition rate of the chelate ring was the fastest in the photosensitive TiO2 gel films which we have examined. Using the photosensitivity, fine patterns (about 5 μm) could be fabricated by UV-irradiation through a mask and leaching.

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Authors and Affiliations

  1. Department of Applied Chemistry, Kinki University, 3-4-1, Kowakae, Higashi-Osaka, Osaka, 577-8502, Japan

    Tomohiro Imao, Takashi Horiuchi, Naoki Noma & Seishiro Ito

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  1. Tomohiro Imao
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  2. Takashi Horiuchi
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  3. Naoki Noma
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  4. Seishiro Ito
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Correspondence to Naoki Noma.

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Imao, T., Horiuchi, T., Noma, N. et al. Preparation of new photosensitive TiO2 gel films using chemical additives including nitrogen and their patterning. J Sol-Gel Sci Technol 39, 119–122 (2006). https://doi.org/10.1007/s10971-006-7286-1

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  • DOI: https://doi.org/10.1007/s10971-006-7286-1

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