Journal of Sol-Gel Science and Technology

, Volume 35, Issue 3, pp 237–243

Preparation of Titanium Oxide Layer on Silica Glass Substrate with Titanium Naphthenate Precursor

  • Kyu Seog Hwang
  • Ju Hyun Jeong
  • Young Sun Jeon
  • Kyung Ok Jeon
  • Byung Hoon Kim
Article

DOI: 10.1007/s10971-005-2023-8

Cite this article as:
Hwang, K.S., Jeong, J.H., Jeon, Y.S. et al. J Sol-Gel Sci Technol (2005) 35: 237. doi:10.1007/s10971-005-2023-8

Abstract

Nanocrystalline TiO2 thin films on silica glass substrates were prepared by using a naphthenic acid precursor. As-deposited thin films were heat treated at 500, 600, 700 and 800C for 30 min in air. The TiO2 thin films were analyzed by High Resolution X-ray diffraction, ultra violet—visible—near infrared spectrophotometer, field emission—scanning electron microscope and scanning probe microscope. After annealing at 600 and 700C, the XRD patterns consist of only anatase peaks of TiO2 film. Rutile(110) peak begins to appear at an annealing temperature of 800C. Relative high transmittance at visible range was obtained for all films except the film annealed at 800C. Optical band gap, Eg, is in the range between 3.53 and 3.78 eV except the TiO2 film annealed at 500C. The best hydrophilicity was achieved with a high-temperature annealing.

Keywords

nanocrystalline TiO2 film annatase rutile transmittance 

Copyright information

© Springer Science + Business Media, Inc. 2005

Authors and Affiliations

  • Kyu Seog Hwang
    • 1
  • Ju Hyun Jeong
    • 1
  • Young Sun Jeon
    • 2
  • Kyung Ok Jeon
    • 2
  • Byung Hoon Kim
    • 2
  1. 1.Department of Applied Optics and Institute of Photoelectronic TechnologyNambu UniversityGwangsan-guRepublic of Korea
  2. 2.Department of Materials Science & EngineeringChonnam National UniversityBuk-guRepublic of Korea

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