Spin Properties of Electrons in Low-Dimensional SiGe Structures

Abstract

Using ESR, we investigate g-factor and spin coherence time τ of electrons confined in 2D Si_1−xGe _x {channels} (x < 0.1) by barriers with x > 0.2 and in SiGe quantum dots grown on prepatterned Si substrates. The quantum wells exhibit 2D-anisotropy of both g and τ which can be explained in terms of the Bychkov–Rashba field. The latter increases with increasing Ge content in the well indicating that the increasing spin-orbit coupling is more important than interface properties. The narrow ESR permits selective spin manipulation already for x > 0.02. Large, regular arrays of Ge quantum dots (about 10⁹) were grown on prepatterned substrates. Strain in the Si capping layer lowers the conduction band relative to that of Ge causing confinement. The g-shift observed implies the possibility of g-tuning by confinement. The line width shows substantial inhomogeneous broadening whereas the longitudinal spin lifetime is hardly changed with respect to 2D structures.