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Assembly of methylated hollow silica nanospheres toward humidity-resistant antireflective porous films with ultralow refractive indices

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Abstract

Humidity-resistant antireflective (AR) porous films with ultralow refractive indices were prepared via an one-step sol–gel process by assembly of methylated hollow silica nanospheres (HSNs). The hydrophobicity and refractive indices of silica-based AR porous films could be varied between 66.0° and 115.0°, and between 1.08 and 1.14, respectively, by tuning the MTES/TEOS molar ratios. A possible assembly mechanism was proposed according to the microstructure of methylated HSNs and porous films. The various properties of silica-based AR porous films were investigated and the AR porous film could demonstrate a good AR capability of 97.6% and excellent humidity resistance.

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Acknowledgements

This work was supported by the National Natural Science Foundation of China (Grant No. 51502274), the Doctoral Research Fund of Southwest University of Science and Technology (Nos. 15zx7137, 16zx7142), and the Research Fund for Joint Laboratory for Extreme Conditions Matter Properties (Nos. 13zxjk04, 14tdjk03).

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Authors and Affiliations

  1. Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology and Research Center of Laser Fusion, Mianyang, 621010, China

    Hongbo Ren, Jiayi Zhu & Yutie Bi

  2. School of Material Science and Engineering, Southwest University of Science and Technology, Mianyang, 621010, China

    Yewei Xu

  3. Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, China

    Lin Zhang

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  1. Hongbo Ren
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  2. Jiayi Zhu
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Correspondence to Hongbo Ren or Lin Zhang.

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Ren, H., Zhu, J., Bi, Y. et al. Assembly of methylated hollow silica nanospheres toward humidity-resistant antireflective porous films with ultralow refractive indices. J Porous Mater 25, 55–62 (2018). https://doi.org/10.1007/s10934-017-0420-3

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