Carbon films were formed on anode (Ni, Cu) substrates from a low-current (10–100 mA) discharge in a He/CH4 mixture at atmospheric pressure. In the case of deposition on substrates without heating, amorphous films with a submicron fractal structure of the surface are formed. Films grown on a heated (~1000°C) substrate have a sandwich graphitized structure.
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Translated from Inzhenerno-Fizicheskii Zhurnal, Vol. 85, No. 6, pp. 1318–1324, November–December, 2012.
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Shushkov, S.V., Krylov, I.S., Gusakova, S.V. et al. Structure of carbon films deposited from a gas discharge at atmospheric pressure. J Eng Phys Thermophy 85, 1426–1431 (2012). https://doi.org/10.1007/s10891-012-0792-9
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DOI: https://doi.org/10.1007/s10891-012-0792-9