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Preventing bacterial growth on implanted device with an interfacial metallic film and penetrating X-rays

  • Jincui An
  • An Sun
  • Yong Qiao
  • Peipei Zhang
  • Ming SuEmail author
Engineering and Nano-engineering Approaches for Medical Devices
Part of the following topical collections:
  1. Engineering and Nano-engineering Approaches for Medical Devices

Abstract

Device-related infections have been a big problem for a long time. This paper describes a new method to inhibit bacterial growth on implanted device with tissue-penetrating X-ray radiation, where a thin m etallic film deposited on the device is used as a radio-sensitizing film for bacterial inhibition. At a given dose of X-ray, the bacterial viability decreases as the thickness of metal film (bismuth) increases. The bacterial viability decreases with X-ray dose increases. At X-ray dose of 2.5 Gy, 98 % of bacteria on 10 nm thick bismuth film are killed; while it is only 25 % of bacteria are killed on the bare petri dish. The same dose of X-ray kills 8 % fibroblast cells that are within a short distance from bismuth film (4 mm). These results suggest that penetrating X-rays can kill bacteria on bismuth thin film deposited on surface of implant device efficiently.

Keywords

Bismuth Fibroblast Cell Colony Number Bismuth Film Initial Bacterial Adhesion 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgments

This work is supported with a Director’s New Innovator Award (1DP2EB016572) from National Institute of Health. We thank Dr. Chaoming Wang for helpful discussions and some data analysis work.

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Copyright information

© Springer Science+Business Media New York 2015

Authors and Affiliations

  • Jincui An
    • 1
  • An Sun
    • 2
  • Yong Qiao
    • 1
  • Peipei Zhang
    • 1
  • Ming Su
    • 1
    Email author
  1. 1.Department of Biomedical EngineeringWorcester Polytechnic InstituteWorcesterUSA
  2. 2.Department of Health Management and InformaticsUniversity of Central FloridaOrlandoUSA

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