Abstract
This study focuses on the Electrostatic, linearity, and analogue/RF parameters of a single heterojunction AlGaAs/GaAs-based high electron mobility transistor (HEMT). The device performance for multiple biases has been evaluated using different figures of merit. The Electrostatic, linearity, and analogue/RF performance have been analyzed from the on-wafer DC and RF measurements. A high ON-state current (31.72 mA) and a smaller sub-threshold swing (82.2 mV/dec) have been achieved. Parameters relating to linearities, such as gm, gm2, gm3, VIP2, VIP3, IIP3, 1-dB compression point, IMD3, THD and analogue/RF parameters like TGF, gds, Av, Cgs, Cgd, Cgg, fT and fmax have been analyzed under different Vds, and excellent results have been obtained for all the bias voltages. Higher values of gm, VIP2, VIP3, IIP3, 1-dB compression point, and lower values of gm2, gm3, IMD3, and THD have been obtained. The RF parameters have likewise yielded significant results in a similar manner. The device is revealed to have remarkable linearity and amplifying ability upon investigating the parameters as mentioned above.
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig1_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig2_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig3_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig4_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig5_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig6_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig7_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig8_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig9_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig10_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig11_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig12_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig13_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig14_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig15_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig16_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig17_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig18_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig19_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs10854-023-11803-x/MediaObjects/10854_2023_11803_Fig20_HTML.png)
Similar content being viewed by others
Data availability
The data presented in this study are available on request from the authors.
References
B. Razavi, RF microelectronics (Prentice-Hall, Hoboken, 1998)
D. Zhang, Z. Li, InP/ZnS quantum dots functionalized AlGaAs/InGaAs open gate high electron mobility transistor. J. Mater. Sci.: Mater. Electron. 29, 10663–10668 (2018). https://doi.org/10.1007/s10854-018-9134-9
M.A. Alim, M.M. Ali, A.A. Rezazadeh, Nonlinear distortion analysis for single heterojunction GaAs HEMT with frequency and temperature. Semicond. Sci. Technol. 33(7), 075002 (2018)
M.A. Alim, M.M. Ali, A.A. Rezazadeh, Investigation of nonlinear distortion in double heterojunction GaAs based pHEMT subject to frequency and temperature. Solid State Electron. 146(April), 44–49 (2018). https://doi.org/10.1016/j.sse.2018.05.008
S. Prasad, A.K. Dwivedi, A. Islam, Characterization of AlGaN/GaN and AlGaN/AlN/GaN HEMTs in terms of mobility and subthreshold slope. J. Comput. Electron. 15(1), 172 (2016). https://doi.org/10.1007/s10825-015-0751-8
A. Sengupta, A. Islam, Comparative analysis of AlGaN/GaN high electron mobility transistor with sapphire and 4H-SiC substrate. Microsyst. Technol. 25(5), 1927 (2019). https://doi.org/10.1007/s00542-018-3903-5
F.A. Fatah et al., Potential of enhancement mode in 0.65 Ga 0.35 As/InAs/In 0.65 Ga 0.35 as HEMTs for using in high-speed and low-power logic applications. ECS J. Solid State Sci. Technol. (2015). https://doi.org/10.1149/2.0171512jss
J. Ajayan, D. Nirmal, 22 nm In0:75Ga0:25As channel-based HEMTs on InP/GaAs substrates for future THz applications. J. Semicond. 38(4), 0–6 (2017). https://doi.org/10.1088/1674-4926/38/4/044001
P. Sharma, S. Singh, S. Gupta et al., Modeling linearity and ambipolarity in GFETs on different dielectrics for communication applications. J. Mater. Sci.: Mater. Electron. 29, 2883–2889 (2018). https://doi.org/10.1007/s10854-017-8218-2
G.P. Rao, T.R. Lenka, N.E.I. Boukortt et al., Investigation of performance enhancement of a recessed gate field-plated AlGaN/AlN/GaN nano-HEMT on β-Ga2O3 substrate with variation of AlN spacer layer thickness. J. Mater. Sci.: Mater. Electron. 34, 1442 (2023). https://doi.org/10.1007/s10854-023-10867-z
A.K. Singh, M.R. Tripathy, P.K. Singh, K. Baral, S. Chander, S. Jit, Deep insight into DC/RF and linearity parameters of a novel back gated ferroelectric TFET on SELBOX substrate for ultra low power applications. Silicon 13(11), 3853–3863 (2021). https://doi.org/10.1007/s12633-020-00672-2
D. Sharma, S.K. Vishvakarma, Analyses of DC and analog/RF performances for short channel quadruple-gate gate-all-around MOSFET. Microelectron. J. 46(8), 731–739 (2015). https://doi.org/10.1016/j.mejo.2015.05.008
A. Es-Sakhi, M.H. Chowdhury, Analytical model to estimate the subthreshold swing of SOI FinFET. Proc. IEEE Int. Conf. Electron. Circuits, Syst. (2013). https://doi.org/10.1109/ICECS.2013.6815343
C. Sandow, J. Knoch, C. Urban, Q.T. Zhao, S. Mantl, Impact of electrostatics and doping concentration on the performance of silicon tunnel field-effect transistors. Solid State Electron. 53(10), 1126–1129 (2009). https://doi.org/10.1016/j.sse.2009.05.009
G. Ghibaudoç, G. Pananakakis, Analytical expressions for subthreshold swing in FDSOI MOS structures. Solid State Electron. 149, 57–61 (2018). https://doi.org/10.1016/j.sse.2018.08.011
M. Nawaz, S. Habibi, H.Q. Zheng, K. Radhakrishnan, K.Y. Lee, G.I. Ng, Design and characterization of AlGaAs/InGaAs/GaAs-based pHEMT device. Microw. Opt. Technol. Lett. 17(1), 50–53 (1998)
S. Khandelwal, S. Member, T.A. Fjeldly, Analysis of drain-current nonlinearity using surface-potential-based model in GaAs pHEMTs. EEE Trans. Microw. Theory Tech. 61(9), 3265–3270 (2013)
C. Zhang, H. Wang, J. Zhang, G. Du, Experiment and simulation of the nonlinear and transient responses of GaAs PHEMT Injected with microwave pulses. IEEE Trans. Electromagn. Compat. 57(5), 1132–1138 (2015)
J. Liu, Y. Zhou, J. Zhu, Y. Cai, K.M. Lau, K.J. Chen, DC and RF characteristics of AlGaN/GaN/InGaN/GaN double-heterojunction HEMTs. IEEE Trans. Electron. Devices 54(1), 2 (2007). https://doi.org/10.1109/TED.2006.887045
J. Du et al., Study on transconductance nonlinearity of AlGaN/GaN HEMTs considering acceptor-like traps in barrier layer under the gate. Solid State Electron. 115, 60–64 (2016). https://doi.org/10.1016/j.sse.2015.10.008
M.A. Alim, A.A. Rezazadeh, Study of third-order intercepts and nonlinear distortion level for S-H GaAs HEMTs. Semicond. Sci. Technol. 35(8), 085001 (2020). https://doi.org/10.1088/1361-6641/ab8c53
M.A. Alim, J. Naima, A.A. Rezazadeh, Thermal sensitivity of microwave pseudomorphic high-electron-mobility transistor performance: pre and post multilayer technology. Phys. Status Solidi Appl. Mater. Sci. 218(18), 1–8 (2021). https://doi.org/10.1002/pssa.202100290
H. Li, Y. Li, H. Jiang et al., Characteristic analysis of the MoS2/SiO2 interface field-effect transistor with varying MoS2 layers. J. Mater. Sci.: Mater. Electron. 34, 427 (2023). https://doi.org/10.1007/s10854-023-09869-8
Y.C. Lin, E.Y. Chang, H. Yamaguchi, W.C. Wu, C.Y. Chang, A δ-doped InGaP/InGaAs pHEMT with different doping profiles for device-linearity improvement. IEEE Trans. Electron. Devices 54(7), 1617–1625 (2007). https://doi.org/10.1109/TED.2007.899398
N.A. Kumari, P. Prithvi, Device and circuit-level performance comparison of GAA nanosheet FET with varied geometrical parameters. Microelectron. J. 125, 105432 (2022). https://doi.org/10.1016/J.MEJO.2022.105432
P. Ghosh, S. Haldar, R.S. Gupta, M. Gupta, An investigation of linearity performance and intermodulation distortion of GME CGT MOSFET for RFIC design. IEEE Trans. Electron. Devices 59(12), 3263–3268 (2012). https://doi.org/10.1109/TED.2012.2219537
S.K. Mohapatra, K.P. Pradhan, L. Artola, P.K. Sahu, Estimation of analog/RF figures-of-merit using device design engineering in gate stack double gate MOSFET. Mater. Sci.Semicond Process 31, 455–462 (2015). https://doi.org/10.1016/j.mssp.2014.12.026
S.K. Mohapatra, K.P. Pradhan, P.K. Sahu, M.R. Kumar, The performance measure of GS-DG MOSFET: an impact of metal gate work function. Adv. Nat. Sci. Nanosci. Nanotechnol. 5(2), 025002 (2014). https://doi.org/10.1088/2043-6262/5/2/025002
L.F. Tiemeijer et al., RF distortion characterisation of sub-micron CMOS. Eur. Solid-State Device Res. Conf. (2000). https://doi.org/10.1109/ESSDERC.2000.194815
A. Baidya, T.R. Lenka, S. Baishya, Linear distortion analysis of 3D double gate junctionless transistor with High-K dielectrics and gate metals. Silicon 13(9), 3113–3120 (2021). https://doi.org/10.1007/s12633-020-00669-x
M.A. Alim, A. Jarndal, C. Gaquiere et al., A study of DC and RF transconductance for different technologies of HEMT at low and high temperatures. J Mater Sci: Mater Electron 34, 892 (2023). https://doi.org/10.1007/s10854-023-10176-5
R. Salazar, A. Ortiz-Conde, F.J. García-Sánchez, C.S. Ho, J.J. Liou, Evaluating MOSFET harmonic distortion by successive integration of the I-V characteristics. Solid State Electron 52(7), 1092–1098 (2008). https://doi.org/10.1016/j.sse.2008.03.018
Q. Cheng, K. Shariar, S. Khandelwal, Y. Zeng, DC and RF performances of InAs FinFET and GAA MOSFET on insulator. Solid State Electron 158(May), 11–15 (2019). https://doi.org/10.1016/j.sse.2019.05.001
G. Caddemi, N.D. Crupi, Temperature effects on DC and small signal RF performance of AlGaAs/GaAs HEMTs. Microelectron. Reliab. 46(1), 169–173 (2006). https://doi.org/10.1016/j.microrel.2005.05.003
M.A. Alim, A.A. Rezazadeh, C. Gaquiere, Multibias and thermal behavior of microwave GaN and GaAs based HEMTs. Solid State Electron. 126, 67–74 (2016). https://doi.org/10.1016/j.sse.2016.09.013
M.A. Alim, A.A. Rezazadeh, C. Gaquiere, Small signal model parameters analysis of GaN and GaAs based HEMTs over temperature for microwave applications. Solid State Electron. 119, 11–18 (2016). https://doi.org/10.1016/j.sse.2016.02.002
T. Wang, L. Lou, C. Lee, A junctionless gate-all-around silicon nanowire FET of high linearity and its potential applications. IEEE Electron Device Lett 34(4), 478–480 (2013). https://doi.org/10.1109/LED.2013.2244056
F. Schwierz, J.J. Liou, Modern microwave transistors: theory, design, and performance (Wiley, Hoboken, 2002)
A. Kumar, S. Manas, R. Tripathy, K. Baral, P. Kumar, S. Satyabrata, Impact of interface trap charges on device level performances of a lateral/vertical gate stacked Ge/Si TFET-on-SELBOX-substrate. Appl. Phys. A (2020). https://doi.org/10.1007/s00339-020-03869-9
V.D. Wangkheirakpam, B. Bhowmick, P.D. Pukhrambam, Linearity performance and intermodulation distortion analysis of D-MOS vertical TFET. Appl Phys A Mater Sci Process 127(5), 340 (2021). https://doi.org/10.1007/s00339-021-04496-8
Funding
The authors would like to acknowledge the partial financial support from “The ICT Division, Government of the People’s Republic of Bangladesh” for the ICT Fellowship (2020–2021) awarded to Jannatul Naima with Grant Number: 56.00.0000.028.33.002.21-232.
Author information
Authors and Affiliations
Contributions
Conceptualization, JN and MAA; methodology, JN and MAA; validation, MAA; investigation, JN and MAA; writing—original draft preparation, JN; writing—review and editing, MAA; supervision, MAA. All authors have read and agreed to the published version of the manuscript.
Corresponding author
Ethics declarations
Conflict of interest
The authors declare no conflict of interest.
Additional information
Publisher’s Note
Springer nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
About this article
Cite this article
Naima, J., Alim, M.A. Electrostatic, linearity and analogue/RF performance analysis of single heterojunction GaAs HEMT. J Mater Sci: Mater Electron 35, 65 (2024). https://doi.org/10.1007/s10854-023-11803-x
Received:
Accepted:
Published:
DOI: https://doi.org/10.1007/s10854-023-11803-x