Abstract
Transparent conductive oxide (TCO) films have significant applications in optoelectronic fields. In this study, we fabricated a large-area (> 3 × 7 cm2) indium–tin–oxide (ITO) film with rod coating strategy and low-temperature lightwave irradiation treatment. We investigated the crystallinity, morphology, and optoelectronic characteristics of ITO thin films using different indium chloride precursor concentrations. Results show that the optimal precursor concentration of 0.5 M allows the ITO films to have > 90% transmittance, < 16.4 Ω/sq sheet resistance, and a 2.39 × 10−2 Ω−1 figure of merit. These results are comparable or superior to those of small- or large-area ITO thin films prepared using the solution process. Overall, our findings pave the way for the fabrication of high-performance and large-area ITO transparent conductive films at low temperatures, facilitating potential applications in low-cost and large-scale TCO electronics.
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Funding
This work was supported by the Natural Science Foundation of Shandong Province (No. ZR2020MF104 and ZR2019MF031). Major innovation project for integrating science, education & industry of Qilu University of Technology (Shandong Academy of Sciences) (No. 2022JBZ01-07).
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All authors made contributions to the planning and design of the study. HL and CR: preparation of ITO film, interpretation of the data, and article writing. QS and MR: characterizations of film properties. SW and GX: Initiation of the work, funding acquisition, and article editing and revising.
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Li, H., Ruan, C., Sun, Q. et al. Large-area rod-coated indium–tin–oxide transparent conductive films for low-cost electronics. J Mater Sci: Mater Electron 34, 2222 (2023). https://doi.org/10.1007/s10854-023-11565-6
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DOI: https://doi.org/10.1007/s10854-023-11565-6