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Preparation of a CaO–Al2O3–B2O3–SiO2 glass/Al2O3 LTCC substrate material with high flexural strength for microwave application

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Abstract

A CaO-Al2O3-B2O3-SiO2 (CABS) glass/Al2O3 LTCC substrate material with high flexural strength for microwave application has been successfully prepared through the avenue of investigating the effects of B2O3 in CABS glass and different glass/ceramic mass ratios on sintering shrinkage behavior, phase composition, microstructure, mechanical properties, and microwave dielectric properties of CABS glass/Al2O3 composites. The results show that adding an appropriate amount of B2O3 can lower the softening temperature of CABS glass and control the interfacial reaction between CABS glass and Al2O3, which is beneficial to the densification of CABS glass/Al2O3 and improves the microwave dielectric and mechanical properties. When the content of B2O3 is 22 wt% (in the CABS glass), the CABS glass/50 wt% Al2O3 sample sintered at 875 °C for 2 h exhibits the best comprehensive properties with the dielectric constant (εr) of 6.95, dielectric loss (tanδ) of 4.56 × 10–3 (~ 10 GHz) and flexural strength of 223 MPa.

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The authors declare that all data generated during the study appear in the submitted article.

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Acknowledgements

This work is supported by the Natural Science Foundation of Hunan Province of China (Grant No. 2022JJ30661).

Funding

Funding was provided by Natural Science Foundation of Hunan Province, 2022JJ30661, Xingyu Chen.

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Authors

Contributions

Xuelian Zhu performed the experiments, data analysis and wrote the manuscript. Haijun Mao and Fenglin Wang contributed to the data analysis and manuscript preparation significantly. Riran Liang, Xingyu Chen, Zhuofeng Liu and Wei Li helped to perform the data analysis with constructive discussions. Weijun Zhang contributed to the conception of the study.

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Correspondence to Haijun Mao or Weijun Zhang.

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Zhu, X., Mao, H., Wang, F. et al. Preparation of a CaO–Al2O3–B2O3–SiO2 glass/Al2O3 LTCC substrate material with high flexural strength for microwave application. J Mater Sci: Mater Electron 34, 1125 (2023). https://doi.org/10.1007/s10854-023-10541-4

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